Grant Application for:
Nanomanufacturing Sciences (NMS) Patterning Thrust Program

Overview

The Nanomanufacturing Sciences (NMS) Patterning Thrust area is soliciting grant applications which propose to explore novel concepts in the following three areas:

• Directed assembly options that enable reduced line edge roughness and dimensional variability
• Direct patterning of electronically useful materials
• Novel atomic and nanoscale materials characterization methods

This initiative is intended to catalyze the creation of novel high-risk material and characterization concepts for extending patterning and metrology technologies to their ultimate limits. Ultimately, the most valued programs will enable research solutions which address industry needs for affordable advanced patterning materials, assembly processes, and characterization methods.

This call for research, issued to universities worldwide, may be addressed by individual investigators or by research teams. Successful grant application submissions are expected to result in awards of unrestricted, non-overhead-bearing gifts. The number and size of the grants awarded will be determined by the amount of available funds and by the number of quality grant applications.

Research Needs

Desired areas of research are outlined in the report on Research Needs for Patterning. Topics include, but are not limited to, systems and components, masks, materials, pattern transfer, metrology, and cross-disciplinary approaches to patterning.

• Research Needs for Patterning

Grant applications are invited which address any of the following top six strategic patterning related research needs. Priority will be given to creative ideas aligned with one or both of the first two topics:

• Directed assembly research which addresses imaging materials issues, such as LER, dimensional control, linearity, and resolution, and directed patterning of electronically useful materials;
• Robust sub-10 nm characterization and metrology tools;
• Radical approaches to affordable and low variability post-NGL patterning;
• Low volume patterning options;
• Extensibility, limits, cost of NGL;
• Breakthroughs in design for patterning; concurrent design, and defect tolerance.

Grant Application Guidelines

Responses are limited to four pages (using at least a 10 pt. font) and must be submitted via the SRC Web site. Non-compliance with these guidelines will exclude grant applications from consideration.

Please include the following identifying information in your grant application:

• Project title
• Investigators
• University
• Telephone number and e-mail address

Please make sure to address the following in your grant application:

• Context: emphasis area and problem to be addressed
• Rationale: value in terms of semiconductor industry needs
• Novelty: role of this research in advancing knowledge and state-of-the-art
• Approach: strategy for addressing the problem
• Results: anticipated output of a successful effort
• IP: identify any related preexisting intellectual property

Awardees in this solicitation will be invited to share the results of their study at a 2005 forum and considered for three-year follow-on support to explore the feasibility of their ideas. Participants will be encouraged to provide data on student participants who would like increased exposure to, and networking with, SRC member companies. An electronic copy of material presented at the 2005 forum and a short final report documenting progress for the program are encouraged. Also, awardees are invited to submit any projects related preprints and publications for inclusion on the SRC website.

Timetable and Deadlines

Please direct all technical questions via e-mail to Daniel J.C. Herr, Director of NMS.
All other questions and responses should be directed to Theresa Cleary or 919-941-9465.