Materials and Methods for Creating Imaging Layers

    • Application Type:
      Continuation
      Patent Number:
      7851252
      Country:
      United States
      Status:
      Filed on 17-Feb-2009, Issued on 14-Dec-2010, Patent Abandoned
      Organization:
      University of Wisconsin - Madison
      SRC Filing ID:
      P1140

    Inventors

    • Harun Hadi Solak (U of Wisconsin/Madison)
    • Sang Ouk Kim (U of Wisconsin/Madison)
    • Paul Nealey (U of Wisconsin/Madison)
    • Charles T. Black (IBM)
    • Erik W. Edwards (U of Wisconsin/Madison)
    • Hawker Craig (IBM)
    • Mark P. Stoykovich (U of Wisconsin/Madison)
    • Juan de Pablo (U of Wisconsin/Madison)

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