Direct Chemical Vapor Deposition of Graphene on Dielectric Sufraces

    • Application Type:
      Utility
      Patent Number:
      8709881
      Country:
      United States
      Status:
      Filed on 2-May-2011, Issued on 29-Apr-2014, Patent Abandoned
      Organization:
      University of California, Berkeley
      SRC Filing ID:
      P1273

    Inventors

    • Ariel Ismach (UC/Berkeley)
    • Yuegang Zhang (Intel)

    Related Patents

    P1211
    Application Expired
    FCRP

    DIRECT CHEMICAL VAPOR DEPOSITION OF GRAPHENE ON DIELECTRIC SURFACES

    Ariel Ismach (UC/Berkeley); Yuegang Zhang (Intel)
    Patent Application Expired
    Application Type: Provisional
    P1229
    Application Expired
    FCRP

    Deposition of a Two-Dimensional Material on a Dielectric Surface

    Ariel Ismach (UC/Berkeley); Yuegang Zhang (Intel)
    Patent Application Expired
    Application Type: Provisional

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