Low Temperature Atomic Layer Deposition of Oxides on Compound Semiconductors
Inventors
- Kasra Sardashti (UC/San Diego)
- Tobin Kaufman-Osborn (Applied)
- Tyler Kent (UC/San Diego)
- Andrew Kummel (UC/San Diego)
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Low Temperature Atomic Layer Deposition of Al2O3 and HfO2 on Silicon-Germanium
Tobin Kaufman-Osborn (Applied); Tyler Kent (UC/San Diego); Andrew Kummel (UC/San Diego); Kasra Sardashti (UC/San Diego)Patent Application Expired
Application Type: Provisional