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GRC Science Area
NMS – Nanomanufacturing Sciences
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| 1 through 18 of
18 similar documents, best matches first. |
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- 1:
Enhanced Stripping of Implanted Resists (Patent P1259) - SRC
- Enhanced Stripping of Implanted Resists Application Type: Utility Patent Number: 8772170 Country: United States Status: Filed on 29-Dec-2010, Issued on 8-Jul-2014, Patent Abandoned ...
URL: https://www.src.org/library/patent/p1259/
Modified: 2014-07-08 - 25KB
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- 2:
GRC SEMATECH Engineering Research Center for Environmentally...
- GRC SEMATECH Engineering Research Center for Environmentally Benign Semiconductor Manufacturing Review Date: Tuesday, March 20, 2012, 4 p.m. - Thursday, March 22, 2012, 2 p.m. MT ...
URL: https://www.src.org/calendar/e004390/
Modified: 2012-09-22 - 78KB
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- 3:
GRC SEMATECH Engineering Research Center for Environmentally...
- GRC SEMATECH Engineering Research Center for Environmentally Benign Semiconductor Manufacturing Site Review Date: Wednesday, March 9, 2011, 8 a.m. - Friday, March 11, 2011, 5 p.m. ...
URL: https://www.src.org/calendar/e003989/
Modified: 2011-09-11 - 73KB
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- 4:
Modification of Polyvinylidene Fluoride Membrane and Method of...
- Modification of Polyvinylidene Fluoride Membrane and Method of Filtering Application Type: Utility Patent Number: 5531900 Country: United States Status: Filed on 7-Jul-1994, Issued ...
URL: https://www.src.org/library/patent/p0020/
Modified: 1996-07-02 - 22KB
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- 5:
TECHCON 2013 (Event E004683) - SRC
- TECHCON 2013 Date: Monday, Sept. 9, 2013, 8 a.m. - Tuesday, Sept. 10, 2013, 10 p.m. CT Location: Renaissance Austin Hotel, Austin, TX, United States Event ID: E004683 E004683 image ...
URL: https://www.src.org/calendar/e004683/
Modified: 2014-03-10 - 136KB
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- 6:
 Slide 1
- ITRS - Deterministic Doping, Thomas Schenkel, LBNL, Nov. 12, 2010 Single Ion Implantation Thomas Schenkel Lawrence Berkeley National Laboratory T_Schenkel@LBL.gov ITRS - ...
URL: https://www.src.org/calendar/e004100/e004100-00-session2.pdf
Modified: 2010-11-29 - 52.6MB
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- 7:
2012 SRC/SEMATECH ERC Review Agenda
- AGENDA 2012 SRC/SEMATECH ERC REVIEW MEETING March 20-22, 2012 Marriott University Park Hotel, Tucson, AZ Tuesday, March 20 4:00 PM - Open Poster Set-Up [Madera Room] Wednesday, ...
URL: https://www.src.org/calendar/e004390/agenda01-30-12.pdf
Modified: 2012-02-17 - 83KB
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- 8:
Engineering Research Center for Environmentally Benign Semiconductor...
- Engineering Research Center for Environmentally Benign Semiconductor Manufacturing Review Date: Tuesday, April 5, 2016, 7 a.m.-4:30 p.m. MT Location: Marriott University Park ...
URL: https://www.src.org/calendar/e005906/
Modified: 2016-10-05 - 49KB
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- 9:
Engineering Research Center for Environmentally Benign Semiconductor...
- Engineering Research Center for Environmentally Benign Semiconductor Manufacturing Review Date: Wednesday, March 20, 2013, 7 a.m. - Thursday, March 21, 2013, 2 p.m. MT Location: ...
URL: https://www.src.org/calendar/e004929/
Modified: 2013-09-21 - 61KB
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- 10:
Engineering Research Center for Environmentally Benign Semiconductor...
- Engineering Research Center for Environmentally Benign Semiconductor Manufacturing Review Date: Wednesday, March 26, 2014, 7:30 a.m. - Thursday, March 27, 2014, 8 p.m. MT Location: ...
URL: https://www.src.org/calendar/e005160/
Modified: 2014-09-27 - 66KB
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- 11:
The Challenges and Opportunities of Atomic Layer Etching (Event...
- The Challenges and Opportunities of Atomic Layer Etching Date: Thursday, May 5, 2016, 2 p.m.-3 p.m. ET Location: University of Arizona, Tucson, AZ, United States Type: e-Workshop ...
URL: https://www.src.org/calendar/e005904/
Modified: 2016-11-05 - 34KB
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- 12:
Reactive Membrane for Filtration and Purification of Gases of...
- Reactive Membrane for Filtration and Purification of Gases of Impurities and Method Utilizing the Same Application Type: Continuation (in part) Patent Number: 5637544 Country: ...
URL: https://www.src.org/library/patent/p0011/
Modified: 1997-06-10 - 25KB
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- 13:
Reactive Membrane for Filtration and Purification of Gases of...
- Reactive Membrane for Filtration and Purification of Gases of Impurities and Method Utilizing the Same Application Type: Divisional Patent Number: 5635148 Country: United States ...
URL: https://www.src.org/library/patent/p0009/
Modified: 1997-06-03 - 25KB
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- 14:
Solventless, Resistless, Direct Dielectric Patterning (Patent...
- Solventless, Resistless, Direct Dielectric Patterning Application Type: Foreign National Patent Number: 171285 Country: Taiwan Status: Filed on 9-Jan-2001, Issued on 2-Jun-2003, ...
URL: https://www.src.org/library/patent/p0207/
Modified: 2003-06-02 - 22KB
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- 15:
Solventless, Resistless, Direct Dielectric Patterning (Patent...
- Solventless, Resistless, Direct Dielectric Patterning Application Type: European Patent Office Patent Number: 1269259 Status: Filed on 11-Jan-2001, Issued on 8-Aug-2012, Patent ...
URL: https://www.src.org/library/patent/p0308/
Modified: 2012-08-08 - 22KB
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- 16:
Method for Patterning a Radiation Sensitive Layer (Patent P0087...
- Method for Patterning a Radiation Sensitive Layer Application Type: Utility Patent Number: 6509138 Country: United States Status: Filed on 12-Jan-2000, Issued on 21-Jan-2003 ...
URL: https://www.src.org/library/patent/p0087/
Modified: 2003-01-21 - 22KB
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- 17:
TECHCON 2011 (Event E004113) - SRC
- TECHCON 2011 Date: Monday, Sept. 12, 2011, 8 a.m. - Tuesday, Sept. 13, 2011, 10 p.m. CT Location: Renaissance Austin Hotel, Austin, TX, United States Event ID: E004113 E004113 ...
URL: https://www.src.org/calendar/e004113/
Modified: 2012-03-13 - 97KB
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- 18:
TECHCON 2012 (Event E004114) - SRC
- TECHCON 2012 Date: Monday, Sept. 10, 2012, 8 a.m. - Tuesday, Sept. 11, 2012, 10 p.m. CT Location: Renaissance Austin Hotel, Austin, TX, United States Event ID: E004114 E004114 ...
URL: https://www.src.org/calendar/e004114/
Modified: 2013-03-11 - 98KB
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