Selective Low Temperature Chemical Vapor Deposition of Titanium Disilicide onto Silicon Regions

• Application Type:

  Utility

  Patent Number:

  5633036

  Country:

  United States

  Status:

  Filed on 21-Apr-1995, Issued on 27-May-1997, Patent Abandoned

  Organization:

  University of Illinois at Urbana-Champaign

  SRC Filing ID:

  P0055

Inventors

• Edmund G. Seebauer (UIUC)
• Michael A. Mendicino (UIUC)