Graphene Device Including a PVA Layer or Formed Using a PVA Layer

    • Application Type:
      Continuation
      Patent Number:
      8735209
      Country:
      United States
      Status:
      Filed on 15-Mar-2013, Issued on 27-May-2014, Patent Abandoned
      Organization:
      Columbia University
      SRC Filing ID:
      P1404

    Inventors

    • Inanc Meric (Columbia)
    • Kenneth Shepard (Columbia)

    Related Patents

    P1190
    Application Expired
    FCRP

    HIGH-PERFORMANCE GATE OXIDES SUCH AS FOR GRAPHENE FIELD-EFFECT TRANSISTORS OR CARBON NANOTUBES

    Inanc Meric (Columbia); Kenneth Shepard (Columbia)
    Patent Application Expired
    Application Type: Provisional
    P1209
    Abandoned Patent
    FCRP

    High-Performance Gate Oxides such as for Graphene Field-Effect Transistors or Carbon Nanotubes

    Inanc Meric (Columbia); Kenneth Shepard (Columbia)
    Patent Abandoned
    Application Type: Utility

    4819 Emperor Blvd, Suite 300 Durham, NC 27703 Voice: (919) 941-9400 Fax: (919) 941-9450

    Important Information for the SRC website. This site uses cookies to store information on your computer. By continuing to use our site, you consent to our cookies. If you are not happy with the use of these cookies, please review our Cookie Policy to learn how they can be disabled. By disabling cookies, some features of the site will not work.