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GRC Science Area
LIT – Lithography Sciences
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1 through 16 of
16 similar documents, best matches first. |
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- 1:
Systems, Methods and Computer Program Products for Detecting...
- Systems, Methods and Computer Program Products for Detecting the Position of a New Alignment Mark on a Substrate Based on Fitting to Sample Alignment Signals Application Type: ...
URL: https://www.src.org/library/patent/p0047/
Modified: 2000-05-16 - 22KB Find Similar Documents
- 2:
Fabrication of Group III-Nitride Photocathode Having Cs Activation...
- Fabrication of Group III-Nitride Photocathode Having Cs Activation Layer Application Type: Continuation (in part) Patent Number: 7455565 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p1082/
Modified: 2008-11-25 - 23KB Find Similar Documents
- 3:
Methods, Apparatus and Computer Program Products for Self-Calibrating...
- Methods, Apparatus and Computer Program Products for Self-Calibrating Two-Dimensional Metrology Stages Application Type: Utility Patent Number: 5798947 Country: United States ...
URL: https://www.src.org/library/patent/p0017/
Modified: 1998-08-25 - 22KB Find Similar Documents
- 4:
Multiple-Thickness Gate Oxide Formed by Oxygen Implantation ...
- Multiple-Thickness Gate Oxide Formed by Oxygen Implantation - device claims Application Type: Utility Patent Number: 6855994 Country: United States Status: Filed on 5-Sep-2001, ...
URL: https://www.src.org/library/patent/p0259/
Modified: 2005-02-15 - 26KB Find Similar Documents
- 5:
Multiple-Thickness Gate Oxide Formed by Oxygen Implantation ...
- Multiple-Thickness Gate Oxide Formed by Oxygen Implantation - Method claims Application Type: Utility Patent Number: 6753229 Country: United States Status: Filed on 24-Nov-1999, ...
URL: https://www.src.org/library/patent/p0086/
Modified: 2004-06-22 - 26KB Find Similar Documents
- 6:
Multiple-Thickness Gate Oxide Formed by Oxygen Implantation ...
- Multiple-Thickness Gate Oxide Formed by Oxygen Implantation Application Type: Foreign National Patent Number: NI154458 Country: Taiwan Status: Filed on 1-Dec-1999, Issued on ...
URL: https://www.src.org/library/patent/p0211/
Modified: 2003-05-07 - 26KB Find Similar Documents
- 7:
Step and Flash Imprint Lithography (Patent P0264) - SRC
- Step and Flash Imprint Lithography Application Type: Utility Patent Number: 6719915 Country: United States Status: Filed on 19-Jul-2001, Issued on 13-Apr-2004 Organization: ...
URL: https://www.src.org/library/patent/p0264/
Modified: 2004-04-13 - 25KB Find Similar Documents
- 8:
Step and Flash Imprint Lithography (Patent P0245) - SRC
- Step and Flash Imprint Lithography Application Type: European Patent Office Patent Number: 1228401 Status: Filed on 3-Mar-2000, Issued on 10-Aug-2005 Organization: University of ...
URL: https://www.src.org/library/patent/p0245/
Modified: 2005-08-10 - 25KB Find Similar Documents
- 9:
Optical Proximity Correction Using Regression (Patent P1118)...
- Optical Proximity Correction Using Regression Application Type: Utility Patent Number: 8201110 Country: United States Status: Filed on 14-Apr-2009, Issued on 12-Jun-2012, Patent ...
URL: https://www.src.org/library/patent/p1118/
Modified: 2012-06-12 - 24KB Find Similar Documents
- 10:
Double Hidden Flexure Microactuator for Phase Mirror Array (Patent...
- Double Hidden Flexure Microactuator for Phase Mirror Array Application Type: Utility Patent Number: 7075699 Country: United States Status: Filed on 28-Sep-2004, Issued on ...
URL: https://www.src.org/library/patent/p0508/
Modified: 2006-07-11 - 22KB Find Similar Documents
- 11:
CHARACTERIZING ABERRATIONS IN AN IMAGING LENS AND APPLICATIONS...
- CHARACTERIZING ABERRATIONS IN AN IMAGING LENS AND APPLICATIONS TO VISUAL TESTING AND INTEGRATED CIRCUIT MASK ANALYSIS Application Type: Utility Patent Number: 7030997 Country: ...
URL: https://www.src.org/library/patent/p0302/
Modified: 2006-04-18 - 22KB Find Similar Documents
- 12:
Method of Locating Areas in an Image Such as a Photo Mask Layout...
- Method of Locating Areas in an Image Such as a Photo Mask Layout That Are Sensitive to Residual Processing Effects Application Type: Continuation (in part) Patent Number: 7155698 ...
URL: https://www.src.org/library/patent/p0409/
Modified: 2006-12-26 - 22KB Find Similar Documents
- 13:
Carbon Nanotubes and Methods of Fabrication Thereof Using a Liquid...
- Carbon Nanotubes and Methods of Fabrication Thereof Using a Liquid Phase Catalyst Precursor Application Type: Utility Patent Number: 6401526 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p0266/
Modified: 2002-06-11 - 22KB Find Similar Documents
- 14:
Step and Flash Imprint Lithography (Patent P0238) - SRC
- Step and Flash Imprint Lithography Application Type: Utility Patent Number: 6334960 Country: United States Status: Filed on 11-Mar-1999, Issued on 1-Jan-2002, Patent Expired ...
URL: https://www.src.org/library/patent/p0238/
Modified: 2002-01-01 - 25KB Find Similar Documents
- 15:
Step and Flash Imprint Lithography (Patent P0233) - SRC
- Step and Flash Imprint Lithography Application Type: Foreign National Patent Number: WO2000054107 A Country: Japan Status: Filed on 3-Mar-2000, Issued on 2-May-2000, Patent Expired ...
URL: https://www.src.org/library/patent/p0233/
Modified: 2000-05-02 - 25KB Find Similar Documents
- 16:
Semiconductor Research Corporation - SRC
- GRC GRC Global Research Collaboration Our motivation is to fund the most relevant and critical research for international companies, so we go where the best university talent ...
URL: https://www.src.org/program/grc/
Modified: 2023-10-10 - 33KB Find Similar Documents
1 through 16 of
16 similar documents, best matches first. |
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