Viewing 301 - 315 of 553
Positive Resist Pattern Formation Through Focused Ion Beam Exposure and Surface Barrier Silylation
Mark Hartney (DARPA); John Melngailis (MIT); David C. Shaver (MIT)Patent Expired
Application Type: Continuation (in part)
Positive-Tone Photoresist Containing Diester Dissolution Inhibitors
Jean J. M. Frechet (Cornell); Sze-Ming Lee (Cornell)Patent Expired
Application Type: Utility
Positive-Tone Photoresist Containing Novel Diester Dissolution Inhibitors
Jean J. M. Frechet (Cornell); Sze-Ming Lee (Cornell)Patent Expired
Application Type: Utility
Process and Apparatus for the Use of Solid Precursor Sources in Liquid Form for Vapor Deposition of Materials
Eric Eisenbraun (SUNY Albany); Alain E. Kaloyeros (SUNY Albany)Patent Expired
Application Type: Utility
Process for Forming Hafnium Oxide Films
Stephen A. Campbell (Univ. of Minnesota); Wayne Gladfelter (Univ. of Minnesota)Patent Expired
Application Type: Utility
Process for Metal Deposition for Microelectronic Interconnections
Panagiotis Argitis (UT/Austin); Adam Heller (UT/Austin)Patent Expired
Application Type: Utility
Process for Preparing a Polyphenylene Polymer
George Barclay (Cornell); Hwan-Kyu Kim (Cornell); Thomas E. Mates (Cornell); Christopher K. Ober (Cornell)Patent Expired
Application Type: Utility
Process for Producing Thin Film Polymer Film by Pulsed Laser Evaporation
Patent ExpiredApplication Type: Utility
Process for the Photochemical Vapor Deposition of Aromatic Polymers
Patent ExpiredApplication Type: Utility
Quantum Bridges Fabricated by Selective Etching of Superlattice Structures
William T. Lynch (SRC); Martin O. Tanner (UCLA); Kang L. Wang (UCLA)Patent Expired
Application Type: Utility
Reactive Membrane for Filtration and Purification of Gases of Impurities
Farhang Shadman (Univ. of Arizona)Patent Expired
Application Type: Utility
Reactive Membrane for Filtration and Purification of Gases of Impurities and Method Utilizing the Same
Farhang Shadman (Univ. of Arizona)Patent Expired
Application Type: Divisional
Reactive Membrane for Filtration and Purification of Gases of Impurities and Method Utilizing the Same
Farhang Shadman (Univ. of Arizona)Patent Expired
Application Type: Continuation (in part)
Securing Heterogeneous 2.5D ICs Against IP Theft Through Dynamic Interposer Obfuscation
Krishnendu Chakrabarty (Duke); Arjun Chaudhuri (Duke); Jonti Talukdar (Duke)Patent Expired
Application Type: Provisional