Methods and Compositions for Forming Aperiodic Patterned Copolymer Films

    • Application Type:
      Utility
      Patent Number:
      8287957
      Country:
      United States
      Status:
      Filed on 22-Nov-2005, Issued on 16-Oct-2012
      Organization:
      University of Wisconsin - Madison
      SRC Filing ID:
      P0517

    Inventors

    • Juan de Pablo (U of Wisconsin/Madison)
    • Paul Nealey (U of Wisconsin/Madison)
    • Sang Ouk Kim (U of Wisconsin/Madison)
    • Mark P. Stoykovich (U of Wisconsin/Madison)
    • Erik W. Edwards (U of Wisconsin/Madison)

    Related Patents

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    Methods and Compositions for forming Aperiodic Patterned Copolymer Films

    Juan de Pablo (U of Wisconsin/Madison); Erik W. Edwards (U of Wisconsin/Madison); Sang Ouk Kim (U of Wisconsin/Madison); Paul Nealey (U of Wisconsin/Madison); Mark P. Stoykovich (U of Wisconsin/Madison)
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    Methods and Compositions for Forming Aperiodic Patterned Copolymer Films

    Juan de Pablo (U of Wisconsin/Madison); Erik W. Edwards (U of Wisconsin/Madison); Sang Ouk Kim (U of Wisconsin/Madison); Paul Nealey (U of Wisconsin/Madison); Mark P. Stoykovich (U of Wisconsin/Madison)
    Patent Application Expired
    Application Type: Patent Cooperation Treaty
    P1024
    Issued
    GRC

    Methods and Compositions for Forming Aperiodic Patterned Copolymer Films

    Juan de Pablo (U of Wisconsin/Madison); Erik W. Edwards (U of Wisconsin/Madison); Sang Ouk Kim (U of Wisconsin/Madison); Paul Nealey (U of Wisconsin/Madison); Mark P. Stoykovich (U of Wisconsin/Madison)
    Patent Issued (on 8-Aug-2007)
    Application Type: European Patent Office
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    Issued
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    Methods and Compositions for Forming Aperiodic Patterned Copolymer Films

    Juan de Pablo (U of Wisconsin/Madison); Erik W. Edwards (U of Wisconsin/Madison); Sang Ouk Kim (U of Wisconsin/Madison); Paul Nealey (U of Wisconsin/Madison); Mark P. Stoykovich (U of Wisconsin/Madison)
    Patent Issued (on 3-Jan-1995)
    Application Type: Foreign National

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