Methods and Compositions for Forming Aperiodic Patterned Copolymer Films

    • Application Type:
      European Patent Office
      Patent Number:
      PCT/US20050425
      Status:
      Filed on 22-Nov-2005, Issued on 8-Aug-2007
      Organization:
      University of Wisconsin - Madison
      SRC Filing ID:
      P1024

    Inventors

    • Juan de Pablo (U of Wisconsin/Madison)
    • Paul Nealey (U of Wisconsin/Madison)
    • Sang Ouk Kim (U of Wisconsin/Madison)
    • Mark P. Stoykovich (U of Wisconsin/Madison)
    • Erik W. Edwards (U of Wisconsin/Madison)

    Related Patents

    P0517
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    Methods and Compositions for Forming Aperiodic Patterned Copolymer Films

    Juan de Pablo (U of Wisconsin/Madison); Erik W. Edwards (U of Wisconsin/Madison); Sang Ouk Kim (U of Wisconsin/Madison); Paul Nealey (U of Wisconsin/Madison); Mark P. Stoykovich (U of Wisconsin/Madison)
    Patent Issued (on 16-Oct-2012)
    Application Type: Utility
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    Methods and Compositions for forming Aperiodic Patterned Copolymer Films

    Juan de Pablo (U of Wisconsin/Madison); Erik W. Edwards (U of Wisconsin/Madison); Sang Ouk Kim (U of Wisconsin/Madison); Paul Nealey (U of Wisconsin/Madison); Mark P. Stoykovich (U of Wisconsin/Madison)
    Patent Application Expired
    Application Type: Provisional
    P0619
    Application Expired
    GRC

    Methods and Compositions for Forming Aperiodic Patterned Copolymer Films

    Juan de Pablo (U of Wisconsin/Madison); Erik W. Edwards (U of Wisconsin/Madison); Sang Ouk Kim (U of Wisconsin/Madison); Paul Nealey (U of Wisconsin/Madison); Mark P. Stoykovich (U of Wisconsin/Madison)
    Patent Application Expired
    Application Type: Patent Cooperation Treaty
    P1025
    Issued
    GRC

    Methods and Compositions for Forming Aperiodic Patterned Copolymer Films

    Juan de Pablo (U of Wisconsin/Madison); Erik W. Edwards (U of Wisconsin/Madison); Sang Ouk Kim (U of Wisconsin/Madison); Paul Nealey (U of Wisconsin/Madison); Mark P. Stoykovich (U of Wisconsin/Madison)
    Patent Issued (on 3-Jan-1995)
    Application Type: Foreign National

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