Method for Correcting a Mask Design Layout

    • Application Type:
      Continuation
      Patent Number:
      7614032
      Country:
      United States
      Status:
      Filed on 11-Dec-2006, Issued on 3-Nov-2009, Patent Abandoned
      Organization:
      University of California, San Diego
      SRC Filing ID:
      P1016

    Inventors

    • Puneet Gupta (UC/San Diego)
    • Dennis M. Sylvester (Univ. of Michigan)
    • Jie Yang (Univ. of Michigan)
    • Andrew Kahng (UC/San Diego)

    Related Patents

    P0386
    Abandoned Patent
    GRC

    Method for Correcting a Mask Design Layout

    Puneet Gupta (UC/San Diego); Andrew Kahng (UC/San Diego); Dennis M. Sylvester (Univ. of Michigan); Jie Yang (Univ. of Michigan)
    Patent Abandoned
    Application Type: Utility

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