Methods and Compositions for Forming Patterns with Isolated or Discrete Features Using Block Copolymer Materials

    • Application Type:
      Utility
      Patent Number:
      8133534
      Country:
      United States
      Status:
      Filed on 17-Jul-2007, Issued on 13-Mar-2012, Patent Abandoned
      Organization:
      University of Wisconsin - Madison
      SRC Filing ID:
      P1043

    Inventors

    • Paul Nealey (U of Wisconsin/Madison)
    • Mark P. Stoykovich (Univ. Colorado/Boulder)
    • Kostas Daoulas (U of Wisconsin/Madison)
    • Huiman Kang (U of Wisconsin/Madison)
    • Marcus Mueller (U of Wisconsin/Madison)
    • Juan de Pablo (U of Wisconsin/Madison)

    Related Patents

    P0646
    Application Expired
    GRC

    Methods and Compositions for Forming Patterns with Isolated or Discrete Features Using Block Coplymer Materials

    Kostas Daoulas (U of Wisconsin/Madison); Juan de Pablo (U of Wisconsin/Madison); Huiman Kang (U of Wisconsin/Madison); Marcus Mueller (U of Wisconsin/Madison); Paul Nealey (U of Wisconsin/Madison); Mark P. Stoykovich (Univ. Colorado/Boulder)
    Patent Application Expired
    Application Type: Provisional
    P1333
    Issued
    GRC

    Methods and Compositions for Forming Patterns with Isolated or Discrete Features Using Block Coplymer Materials

    Kostas Daoulas (U of Wisconsin/Madison); Juan de Pablo (U of Wisconsin/Madison); Huiman Kang (U of Wisconsin/Madison); Marcus Mueller (U of Wisconsin/Madison); Paul Nealey (U of Wisconsin/Madison); Mark P. Stoykovich (Univ. Colorado/Boulder)
    Patent Issued (on 6-Aug-2013)
    Application Type: Divisional

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