Methods and Compositions for Forming Patterns with Isolated or Discrete Features Using Block Coplymer Materials

    • Application Type:
      Divisional
      Patent Number:
      8501304
      Country:
      United States
      Status:
      Filed on 3-Feb-2012, Issued on 6-Aug-2013
      Organization:
      University of Wisconsin - Madison
      SRC Filing ID:
      P1333

    Inventors

    • Paul Nealey (U of Wisconsin/Madison)
    • Mark P. Stoykovich (Univ. Colorado/Boulder)
    • Kostas Daoulas (U of Wisconsin/Madison)
    • Huiman Kang (U of Wisconsin/Madison)
    • Marcus Mueller (U of Wisconsin/Madison)
    • Juan de Pablo (U of Wisconsin/Madison)

    Related Patents

    P0646
    Application Expired
    GRC

    Methods and Compositions for Forming Patterns with Isolated or Discrete Features Using Block Coplymer Materials

    Kostas Daoulas (U of Wisconsin/Madison); Juan de Pablo (U of Wisconsin/Madison); Huiman Kang (U of Wisconsin/Madison); Marcus Mueller (U of Wisconsin/Madison); Paul Nealey (U of Wisconsin/Madison); Mark P. Stoykovich (Univ. Colorado/Boulder)
    Patent Application Expired
    Application Type: Provisional
    P1043
    Abandoned Patent
    GRC

    Methods and Compositions for Forming Patterns with Isolated or Discrete Features Using Block Copolymer Materials

    Kostas Daoulas (U of Wisconsin/Madison); Juan de Pablo (U of Wisconsin/Madison); Huiman Kang (U of Wisconsin/Madison); Marcus Mueller (U of Wisconsin/Madison); Paul Nealey (U of Wisconsin/Madison); Mark P. Stoykovich (Univ. Colorado/Boulder)
    Patent Abandoned
    Application Type: Utility

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