Questions?
[x] GRC Science Area
NMS – Nanomanufacturing Sciences

Content Type
Patent Filings 26
Events 21
Other 1

SRC Program
GRC 42
SRC 6

Year
2016 2
2014 1
2013 2
2012 4
2011 4
2010 8

Center
EBSM 13
C2S2 5
FENA 5
GSRC 5
IFC 5
MSD 5
MuSyC 3
TxACE 2
ACE4S 1
C-FAR 1
CAIST 1
CDADIC 1
CEMPI 1
CHIRP 1
CNFD 1
FAME 1
INDEX 1
IPC 1
LEAST 1
NCRC 1
NPT 1
SONIC 1
SWAN 1
TerraSwarm 1

Thrust/Theme
ESH – Environment Safety and Hea... 12
PAT – Patterning 12
NEM – Nanoengineered Materials 10
PatMat – Patterning Materials 4
FACSYS – Factory Systems 2
Masks 2
ADS – Alternative Device Structu... 1
AIHW – Artificial Intelligence H... 1
AMS – Analog and Mixed-Signal De... 1
AMS-CSD – Analog/Mixed-Signal Ci... 1
AdvTech – Advanced Technology 1
Advanced Bipolar SOI-MOS Transis... 1
Advanced Devices 1
Advanced Devices & Technologies 1
Advanced Technology Option 1
Analysis Design & Simulation 1
BEP – Back End Processes 1
Back End Processes 1
C&S – Controls and Sensing 1
CADT – Computer-Aided Design and... 1
CD – Circuit Design 1
CFM&TCM – CFM & Total Chemical M... 1
CM – Compact Modeling 1
CSR – Cross-Disciplinary Semicon... 1
Contamination Control 1
Cost Reduction 1
DCMOS – Digital CMOS Technologie... 1
DE – Design Environment 1
DSMS – Device Sciences Modeling ... 1
DV – Design Verification 1
Defect Reduction 1
Deposition 1
DesSyn – Design Synthesis 1
DesTech – Design Techniques 1
Doping Technologies 1
EP3C – Efficiency and Performanc... 1
Equip Automation & Process Contr... 1
Equip – Equipment 1
Equip. Auto. and Process Control 1
FAM – Factory Automation & Manag... 1
FEOL – FEOL Processes 1
FacOps – Factory Operations 1
Factory Systems 1
Front End Processes 1
HWS – Hardware Security 1
Heat Signal & Power Distribution 1
Heat Signal Power 1
I3T – Innovative and Intelligent... 1
ISD – Integrated System Design 1
Interconnect Architecture 1
LMD – Logic and Memory Devices 1
LPD – Logic & Physical Design 1
Lithography 1
Logic Design 1
Logistics & Modeling/Simulation 1
MT – Memory Technologies 1
MTMP – Metrology Tools Matls & P... 1
Materials 1
Materials & Measurements 1
Metrology 1
Modeling & Simulation 1
Modeling & TCAD 1
Multi-level Interconnect 1
NCR – Non-Classical CMOS Researc... 1
NMP – Nanomanufacturing Material... 1
PKG – Packaging 1
PMM – Packaging Materials and Me... 1
PMS – Packaging Modeling and Sim... 1
PS/E – Process Simplification/En... 1
Package & Electrical Design 1
Package Reliability 1
Packaging & Interconnect Systems 1
Packaging Materials Interfaces 1
Pat(MPS) – Patterning 1
PatSys – Patterning Systems 1
PhyDes – Physical Design 1
Physical Design 1
Plasma Etch 1
Process Architecture 1
Processes – Processes 1
Quality & Reliability 1
Rapid Yield Learning 1
Reliability 1
Resist 1
SLD – System Level Design 1
SemiSynBio – Semiconductor Synth... 1
Semiconductor Modeling & Simulat... 1
Signal/Power Management 1
Substrates 1
Synthesis & Verification 1
TCAD-MBPS 1
TM – Thermal Management 1
TT – Test & Testability 1
TechCAD – Technology CAD 1
VER – Verification 1

1 through 30 of 48 similar documents, best matches first.   
Results by:Thunderstone Page: 1 2 next >>
1: pdfスライド 1
1 2nd ITRS Deterministic Doping Workshop, Nov. 12, 2010, D. Herr & T. Shinada International Technology Roadmap for Semiconductors 2nd Deterministic Doping Workshop Emerging ...
URL: https://www.src.org/calendar/e004100/e004100-summary.pdf
Modified: 2010-11-29 - 816KB
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2: NMS Nanoengineered Materials Annual Review (Event E004780) -...
NMS Nanoengineered Materials Annual Review Date: Tuesday, June 12, 2012 - Wednesday, June 13, 2012 Location: Dean's Suite 290, College of Business, 1307 West Highland St., ...
URL: https://www.src.org/calendar/e004780/
Modified: 2012-12-13 - 57KB
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3: pdfSlide 1
ITRS - Deterministic Doping, Thomas Schenkel, LBNL, Nov. 12, 2010 Single Ion Implantation Thomas Schenkel Lawrence Berkeley National Laboratory T_Schenkel@LBL.gov ITRS - ...
URL: https://www.src.org/calendar/e004100/e004100-00-session2.pdf
Modified: 2010-11-29 - 52.6MB
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4: Graphene (Multiplayer) Boron Niride Heteroepitaxy for Electronic...
Graphene (Multiplayer) Boron Niride Heteroepitaxy for Electronic Device Applications Application Type: Continuation Patent Number: 8946692 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p1500/
Modified: 2015-02-03 - 24KB
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5: GRC SEMATECH Engineering Research Center for Environmentally...
GRC SEMATECH Engineering Research Center for Environmentally Benign Semiconductor Manufacturing Review Date: Tuesday, March 20, 2012, 4 p.m. - Thursday, March 22, 2012, 2 p.m. MT ...
URL: https://www.src.org/calendar/e004390/
Modified: 2012-09-22 - 78KB
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6: pdfスライド 1
1 2nd ITRS Deterministic Doping Workshop, Nov. 12, 2010, D. Herr & T. Shinada 2nd Deterministic Doping Workshop Emerging Research Materials (ERM) International Technology Roadmap ...
URL: https://www.src.org/...04100/e004100-00-presentationherr.pdf
Modified: 2010-12-01 - 1.8MB
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7: Engineering Research Center for Environmentally Benign Semiconductor...
Engineering Research Center for Environmentally Benign Semiconductor Manufacturing Review Date: Wednesday, March 26, 2014, 7:30 a.m. - Thursday, March 27, 2014, 8 p.m. MT Location: ...
URL: https://www.src.org/calendar/e005160/
Modified: 2014-09-27 - 66KB
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8: GRC SEMATECH Engineering Research Center for Environmentally...
GRC SEMATECH Engineering Research Center for Environmentally Benign Semiconductor Manufacturing Site Review Date: Wednesday, March 9, 2011, 8 a.m. - Friday, March 11, 2011, 5 p.m. ...
URL: https://www.src.org/calendar/e003989/
Modified: 2011-09-11 - 73KB
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9: TECHCON 2013 (Event E004683) - SRC
TECHCON 2013 Date: Monday, Sept. 9, 2013, 8 a.m. - Tuesday, Sept. 10, 2013, 10 p.m. CT Location: Renaissance Austin Hotel, Austin, TX, United States Event ID: E004683 E004683 image ...
URL: https://www.src.org/calendar/e004683/
Modified: 2014-03-10 - 136KB
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10: pdfNMS Patterning Review Agenda
NMS Patterning Review Agenda Date: Tuesday, October 4, 2011 - Thursday, October 6, 2011 Location: The Solution Center, Durham, NC 27703 Tuesday, October 4, 2011 7:30 - 8:30 a.m. ...
URL: https://www.src.org/calendar/e004187/e004187-agenda.pdf
Modified: 2011-09-22 - 44KB
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11: Semiconductor Research Corporation - SRC
GRC GRC Global Research Collaboration Our motivation is to fund the most relevant and critical research for international companies, so we go where the best university talent ...
URL: https://www.src.org/program/grc/
Modified: 2023-10-10 - 33KB
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12: Engineering Research Center for Environmentally Benign Semiconductor...
Engineering Research Center for Environmentally Benign Semiconductor Manufacturing Review Date: Wednesday, March 20, 2013, 7 a.m. - Thursday, March 21, 2013, 2 p.m. MT Location: ...
URL: https://www.src.org/calendar/e004929/
Modified: 2013-09-21 - 61KB
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13: GRAPHENE/(MULTILAYER) BORON NITRIDE HETEROEPITAXY FOR ELECTRONIC...
GRAPHENE/(MULTILAYER) BORON NITRIDE HETEROEPITAXY FOR ELECTRONIC DEVICE APPLICATIONS Application Type: Divisional Patent Number: 8338825 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p1311/
Modified: 2012-12-25 - 24KB
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14: Methods of Forming Graphene/(Multilayer) Boron Nitride for Electronic...
Methods of Forming Graphene/(Multilayer) Boron Nitride for Electronic Device Applications Application Type: Utility Patent Number: 8158200 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p1170/
Modified: 2012-04-17 - 24KB
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15: Engineering Research Center for Environmentally Benign Semiconductor...
Engineering Research Center for Environmentally Benign Semiconductor Manufacturing Review Date: Tuesday, April 5, 2016, 7 a.m.-4:30 p.m. MT Location: Marriott University Park ...
URL: https://www.src.org/calendar/e005906/
Modified: 2016-10-05 - 49KB
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16: TECHCON 2010 Evaluation Summary - SRC
TECHCON 2010 Evaluation Summary Overall, 134 TECHCON attendees returned evaluations; breakdown by question is: The papers/posters presented indicate research of value to the ...
URL: https://www.src.org/calendar/e003428/evaluation/
Modified: 2010-09-30 - 26KB
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17: Fabrication of Group III-Nitride Photocathode Having Cs Activation...
Fabrication of Group III-Nitride Photocathode Having Cs Activation Layer Application Type: Continuation (in part) Patent Number: 7455565 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p1082/
Modified: 2008-11-25 - 23KB
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18: Molecular Glass Photoresists (Patent P0566) - SRC
Molecular Glass Photoresists Application Type: Utility Patent Number: 7452658 Country: United States Status: Filed on 16-Feb-2006, Issued on 18-Nov-2008, Patent Abandoned ...
URL: https://www.src.org/library/patent/p0566/
Modified: 2008-11-18 - 23KB
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19: Graphene Formation on Dielectrics and Electronic Devices formed...
Graphene Formation on Dielectrics and Electronic Devices formed Therefrom Application Type: Patent Cooperation Treaty Patent Number: PCT/US2011/066 Status: Filed on 21-Dec-2011, ...
URL: https://www.src.org/library/patent/p1370/
Modified: 2013-09-06 - 24KB
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20: Graphene Formation on Dielectrics and Electronic Devices Formed...
Graphene Formation on Dielectrics and Electronic Devices Formed Therefrom Application Type: Utility Patent Number: 8685802 Country: United States Status: Filed on 29-Dec-2010, ...
URL: https://www.src.org/library/patent/p1264/
Modified: 2014-04-01 - 25KB
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21: Multiple-Thickness Gate Oxide Formed by Oxygen Implantation ...
Multiple-Thickness Gate Oxide Formed by Oxygen Implantation - Method claims Application Type: Utility Patent Number: 6753229 Country: United States Status: Filed on 24-Nov-1999, ...
URL: https://www.src.org/library/patent/p0086/
Modified: 2004-06-22 - 26KB
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22: Method for Patterning a Radiation Sensitive Layer (Patent P0087...
Method for Patterning a Radiation Sensitive Layer Application Type: Utility Patent Number: 6509138 Country: United States Status: Filed on 12-Jan-2000, Issued on 21-Jan-2003 ...
URL: https://www.src.org/library/patent/p0087/
Modified: 2003-01-21 - 22KB
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23: Enhanced Stripping of Implanted Resists (Patent P1259) - SRC
Enhanced Stripping of Implanted Resists Application Type: Utility Patent Number: 8772170 Country: United States Status: Filed on 29-Dec-2010, Issued on 8-Jul-2014, Patent Abandoned ...
URL: https://www.src.org/library/patent/p1259/
Modified: 2014-07-08 - 25KB
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24: Solventless, Resistless, Direct Dielectric Patterning (Patent...
Solventless, Resistless, Direct Dielectric Patterning Application Type: Foreign National Patent Number: 171285 Country: Taiwan Status: Filed on 9-Jan-2001, Issued on 2-Jun-2003, ...
URL: https://www.src.org/library/patent/p0207/
Modified: 2003-06-02 - 22KB
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25: Solventless, Resistless, Direct Dielectric Patterning (Patent...
Solventless, Resistless, Direct Dielectric Patterning Application Type: European Patent Office Patent Number: 1269259 Status: Filed on 11-Jan-2001, Issued on 8-Aug-2012, Patent ...
URL: https://www.src.org/library/patent/p0308/
Modified: 2012-08-08 - 22KB
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26: Stress-Free Mount for Imaging Mask (Patent P0076) - SRC
Stress-Free Mount for Imaging Mask Application Type: Utility Patent Number: 5536559 Country: United States Status: Filed on 22-Nov-1994, Issued on 16-Jul-1996, Patent Expired ...
URL: https://www.src.org/library/patent/p0076/
Modified: 1996-07-16 - 24KB
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27: Methods and Compositions for Forming Aperiodic Patterned Copolymer...
Methods and Compositions for Forming Aperiodic Patterned Copolymer Films Application Type: Foreign National Patent Number: 5377857 Country: Japan Status: Filed on 22-Nov-2005, ...
URL: https://www.src.org/library/patent/p1025/
Modified: 1995-01-03 - 27KB
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28: Methods and Compositions for Forming Aperiodic Patterned Copolymer...
Methods and Compositions for Forming Aperiodic Patterned Copolymer Films Application Type: European Patent Office Patent Number: PCT/US20050425 Status: Filed on 22-Nov-2005, Issued ...
URL: https://www.src.org/library/patent/p1024/
Modified: 2007-08-08 - 26KB
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29: Methods and Compositions for Forming Aperiodic Patterned Copolymer...
Methods and Compositions for Forming Aperiodic Patterned Copolymer Films Application Type: Utility Patent Number: 8287957 Country: United States Status: Filed on 22-Nov-2005, ...
URL: https://www.src.org/library/patent/p0517/
Modified: 2012-10-16 - 27KB
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30: Density Multiplication and Improved Lithography by Directed Block...
Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly Application Type: Utility Patent Number: 9183870 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p1116/
Modified: 2015-11-10 - 26KB
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1 through 30 of 48 similar documents, best matches first.   
Results by:Thunderstone Page: 1 2 next >>