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GRC Science Area
LIT – Lithography Sciences
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41 similar documents, best matches first. |
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- 1:
Stress-Free Mount for Imaging Mask (Patent P0056) - SRC
- Stress-Free Mount for Imaging Mask Application Type: Divisional Patent Number: 5675403 Country: United States Status: Filed on 28-May-1996, Issued on 7-Oct-1997, Patent Expired ...
URL: https://www.src.org/library/patent/p0056/
Modified: 1997-10-07 - 24KB Find Similar Documents
- 2:
Stress-Free Mount for Imaging Mask (Patent P0076) - SRC
- Stress-Free Mount for Imaging Mask Application Type: Utility Patent Number: 5536559 Country: United States Status: Filed on 22-Nov-1994, Issued on 16-Jul-1996, Patent Expired ...
URL: https://www.src.org/library/patent/p0076/
Modified: 1996-07-16 - 24KB Find Similar Documents
- 3:
Method and Apparatus for Providing Film Stress Measurements Based...
- Method and Apparatus for Providing Film Stress Measurements Based on Substrates Displacement Application Type: Utility Patent Number: 6826491 Country: United States Status: Filed ...
URL: https://www.src.org/library/patent/p0209/
Modified: 2004-11-30 - 22KB Find Similar Documents
- 4:
Guided Self-Assembly of Block Copolymer Films on Interferometrically...
- Guided Self-Assembly of Block Copolymer Films on Interferometrically Nanopatterned Substrates Application Type: Divisional Patent Number: 6926953 Country: United States Status: ...
URL: https://www.src.org/library/patent/p0445/
Modified: 2005-08-09 - 22KB Find Similar Documents
- 5:
Methods for Decreasing Surface Roughness in Novolak-Based Resists...
- Methods for Decreasing Surface Roughness in Novolak-Based Resists Application Type: Utility Patent Number: 6162592 Country: United States Status: Filed on 6-Oct-1998, Issued on ...
URL: https://www.src.org/library/patent/p0164/
Modified: 2000-12-19 - 22KB Find Similar Documents
- 6:
Guided Self-Assembly of Block Copolymer Films on Interferometrically...
- Guided Self-Assembly of Block Copolymer Films on Interferometrically Nanopatterned Substrates Application Type: Utility Patent Number: 6746825 Country: United States Status: Filed ...
URL: https://www.src.org/library/patent/p0293/
Modified: 2004-06-08 - 23KB Find Similar Documents
- 7:
Methods and Compositions for Imaging Acids in Chemically Amplified...
- Methods and Compositions for Imaging Acids in Chemically Amplified Photoresists Using pH-Dependent Fluorophores Application Type: Divisional Patent Number: 6566030 Country: United ...
URL: https://www.src.org/library/patent/p0224/
Modified: 2003-05-20 - 23KB Find Similar Documents
- 8:
Methods and Compositions for Imaging Acids in Chemically Amplified...
- Methods and Compositions for Imaging Acids in Chemically Amplified Photoresists Using pH-Dependent Fluorophores Application Type: Utility Patent Number: 6376149 Country: United ...
URL: https://www.src.org/library/patent/p0088/
Modified: 2002-04-23 - 23KB Find Similar Documents
- 9:
Multi-Layered Attenuated Phase Shift Mask and a Method for Making...
- Multi-Layered Attenuated Phase Shift Mask and a Method for Making the Mask Application Type: Utility Patent Number: 5939227 Country: United States Status: Filed on 9-Mar-1998, ...
URL: https://www.src.org/library/patent/p0052/
Modified: 1999-08-17 - 30KB Find Similar Documents
- 10:
Attenuated Phase Shift Mask and a Method for Making the Mask...
- Attenuated Phase Shift Mask and a Method for Making the Mask Application Type: Utility Patent Number: 6309780 Country: United States Status: Filed on 15-Jun-1999, Issued on ...
URL: https://www.src.org/library/patent/p0380/
Modified: 2001-10-30 - 22KB Find Similar Documents
- 11:
Twin Mask, and Method and System for Using Same to Pattern Microelectr...
- Twin Mask, and Method and System for Using Same to Pattern Microelectronic Substrates Application Type: Utility Patent Number: 5438204 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p0034/
Modified: 1995-08-01 - 22KB Find Similar Documents
- 12:
CHARACTERIZING ABERRATIONS IN AN IMAGING LENS AND APPLICATIONS...
- CHARACTERIZING ABERRATIONS IN AN IMAGING LENS AND APPLICATIONS TO VISUAL TESTING AND INTEGRATED CIRCUIT MASK ANALYSIS Application Type: Utility Patent Number: 7030997 Country: ...
URL: https://www.src.org/library/patent/p0302/
Modified: 2006-04-18 - 22KB Find Similar Documents
- 13:
Method of Locating Areas in an Image Such as a Photo Mask Layout...
- Method of Locating Areas in an Image Such as a Photo Mask Layout That Are Sensitive to Residual Processing Effects Application Type: Continuation (in part) Patent Number: 7155698 ...
URL: https://www.src.org/library/patent/p0409/
Modified: 2006-12-26 - 22KB Find Similar Documents
- 14:
Methods, Apparatus and Computer Program Products for Self-Calibrating...
- Methods, Apparatus and Computer Program Products for Self-Calibrating Two-Dimensional Metrology Stages Application Type: Utility Patent Number: 5798947 Country: United States ...
URL: https://www.src.org/library/patent/p0017/
Modified: 1998-08-25 - 22KB Find Similar Documents
- 15:
Multiple-Thickness Gate Oxide Formed by Oxygen Implantation ...
- Multiple-Thickness Gate Oxide Formed by Oxygen Implantation Application Type: Foreign National Patent Number: NI154458 Country: Taiwan Status: Filed on 1-Dec-1999, Issued on ...
URL: https://www.src.org/library/patent/p0211/
Modified: 2003-05-07 - 26KB Find Similar Documents
- 16:
Step and Flash Imprint Lithography (Patent P0264) - SRC
- Step and Flash Imprint Lithography Application Type: Utility Patent Number: 6719915 Country: United States Status: Filed on 19-Jul-2001, Issued on 13-Apr-2004 Organization: ...
URL: https://www.src.org/library/patent/p0264/
Modified: 2004-04-13 - 25KB Find Similar Documents
- 17:
Step and Flash Imprint Lithography (Patent P0245) - SRC
- Step and Flash Imprint Lithography Application Type: European Patent Office Patent Number: 1228401 Status: Filed on 3-Mar-2000, Issued on 10-Aug-2005 Organization: University of ...
URL: https://www.src.org/library/patent/p0245/
Modified: 2005-08-10 - 25KB Find Similar Documents
- 18:
Step and Flash Imprint Lithography (Patent P0238) - SRC
- Step and Flash Imprint Lithography Application Type: Utility Patent Number: 6334960 Country: United States Status: Filed on 11-Mar-1999, Issued on 1-Jan-2002, Patent Expired ...
URL: https://www.src.org/library/patent/p0238/
Modified: 2002-01-01 - 25KB Find Similar Documents
- 19:
Step and Flash Imprint Lithography (Patent P0233) - SRC
- Step and Flash Imprint Lithography Application Type: Foreign National Patent Number: WO2000054107 A Country: Japan Status: Filed on 3-Mar-2000, Issued on 2-May-2000, Patent Expired ...
URL: https://www.src.org/library/patent/p0233/
Modified: 2000-05-02 - 25KB Find Similar Documents
- 20:
Water-Processable Photoresist Compositions (Patent P0186) - SRC
- Water-Processable Photoresist Compositions Application Type: Utility Patent Number: 6399273 Country: United States Status: Filed on 14-Aug-2000, Issued on 4-Jun-2002, Patent ...
URL: https://www.src.org/library/patent/p0186/
Modified: 2002-06-04 - 26KB Find Similar Documents
- 21:
Multiple-Thickness Gate Oxide Formed by Oxygen Implantation ...
- Multiple-Thickness Gate Oxide Formed by Oxygen Implantation - device claims Application Type: Utility Patent Number: 6855994 Country: United States Status: Filed on 5-Sep-2001, ...
URL: https://www.src.org/library/patent/p0259/
Modified: 2005-02-15 - 26KB Find Similar Documents
- 22:
Water-Processable Photoresist Compositions (Patent P0272) - SRC
- Water-Processable Photoresist Compositions Application Type: Foreign National Patent Number: 2001-517217 Country: Japan Status: Filed on 14-Aug-2000, Issued on 5-Feb-2005 ...
URL: https://www.src.org/library/patent/p0272/
Modified: 2005-02-05 - 26KB Find Similar Documents
- 23:
Water-Processable Photoresist Compositions (Patent P0282) - SRC
- Water-Processable Photoresist Compositions Application Type: European Patent Office Patent Number: EP1240552 Status: Filed on 14-Aug-2000, Issued on 8-Sep-2005, Patent Abandoned ...
URL: https://www.src.org/library/patent/p0282/
Modified: 2005-09-08 - 26KB Find Similar Documents
- 24:
Multiple-Thickness Gate Oxide Formed by Oxygen Implantation ...
- Multiple-Thickness Gate Oxide Formed by Oxygen Implantation - Method claims Application Type: Utility Patent Number: 6753229 Country: United States Status: Filed on 24-Nov-1999, ...
URL: https://www.src.org/library/patent/p0086/
Modified: 2004-06-22 - 26KB Find Similar Documents
- 25:
Water-Soluble Photoinitiators (Patent P0013) - SRC
- Water-Soluble Photoinitiators Application Type: Utility Patent Number: 5648196 Country: United States Status: Filed on 14-Jul-1995, Issued on 15-Jul-1997, Patent Expired ...
URL: https://www.src.org/library/patent/p0013/
Modified: 1997-07-15 - 24KB Find Similar Documents
- 26:
Fabrication of Group III-Nitride Photocathode Having Cs Activation...
- Fabrication of Group III-Nitride Photocathode Having Cs Activation Layer Application Type: Continuation (in part) Patent Number: 7455565 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p1082/
Modified: 2008-11-25 - 23KB Find Similar Documents
- 27:
Using Block Copolymers as Supercritical Fluid Developable Photoresists...
- Using Block Copolymers as Supercritical Fluid Developable Photoresists Application Type: Utility Patent Number: 6379874 Country: United States Status: Filed on 26-Oct-1999, Issued ...
URL: https://www.src.org/library/patent/p0097/
Modified: 2002-04-30 - 22KB Find Similar Documents
- 28:
Optical Proximity Correction Using Regression (Patent P1118)...
- Optical Proximity Correction Using Regression Application Type: Utility Patent Number: 8201110 Country: United States Status: Filed on 14-Apr-2009, Issued on 12-Jun-2012, Patent ...
URL: https://www.src.org/library/patent/p1118/
Modified: 2012-06-12 - 24KB Find Similar Documents
- 29:
Patterning Methods and Systems Using Reflected Interference Patterns...
- Patterning Methods and Systems Using Reflected Interference Patterns Application Type: Continuation Patent Number: 6967067 Country: United States Status: Filed on 9-Mar-2004, ...
URL: https://www.src.org/library/patent/p0428/
Modified: 2005-11-22 - 22KB Find Similar Documents
- 30:
Double Hidden Flexure Microactuator for Phase Mirror Array (Patent...
- Double Hidden Flexure Microactuator for Phase Mirror Array Application Type: Utility Patent Number: 7075699 Country: United States Status: Filed on 28-Sep-2004, Issued on ...
URL: https://www.src.org/library/patent/p0508/
Modified: 2006-07-11 - 22KB Find Similar Documents
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