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Thrust/Theme
PAT – Patterning
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| 1 through 28 of
28 similar documents, best matches first. |
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- 1:
Semiconductor Research Corporation - SRC
- GRC GRC Global Research Collaboration Our motivation is to fund the most relevant and critical research for international companies, so we go where the best university talent ...
URL: https://www.src.org/program/grc/
Modified: 2023-10-10 - 33KB
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- 2:
 August 2011 Patterning Review Agenda
- GRC Patterning Review Agenda Date: Wednesday, August 24, 2011 - Thursday, August 25, 2011 Location: 540 A/B Cory Hall, UC-Berkeley Campus, Berkeley, CA Wednesday, August 24, 2011 ...
URL: https://www.src.org/calendar/e004185/061011-agenda.pdf
Modified: 2011-06-10 - 67KB
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- 3:
Materials and Methods for Creating Imaging Layers (Patent P1140...
- Materials and Methods for Creating Imaging Layers Application Type: Continuation Patent Number: 7851252 Country: United States Status: Filed on 17-Feb-2009, Issued on 14-Dec-2010, ...
URL: https://www.src.org/library/patent/p1140/
Modified: 2010-12-14 - 26KB
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- 4:
Materials and Methods for Creating Imaging Layers (Patent P1002...
- Materials and Methods for Creating Imaging Layers Application Type: European Patent Office Patent Number: 06251517.6 Status: Filed on 22-Mar-2006, Issued on 13-Oct-2009 ...
URL: https://www.src.org/library/patent/p1002/
Modified: 2009-10-13 - 26KB
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- 5:
Materials and Methods for Creating Imaging Layers (Patent P0626...
- Materials and Methods for Creating Imaging Layers Application Type: Utility Patent Number: 7514764 Country: United States Status: Filed on 21-Mar-2006, Issued on 7-Apr-2009 ...
URL: https://www.src.org/library/patent/p0626/
Modified: 2009-04-07 - 26KB
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- 6:
Multiple-Thickness Gate Oxide Formed by Oxygen Implantation ...
- Multiple-Thickness Gate Oxide Formed by Oxygen Implantation - device claims Application Type: Utility Patent Number: 6855994 Country: United States Status: Filed on 5-Sep-2001, ...
URL: https://www.src.org/library/patent/p0259/
Modified: 2005-02-15 - 26KB
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- 7:
Step and Flash Imprint Lithography (Patent P0264) - SRC
- Step and Flash Imprint Lithography Application Type: Utility Patent Number: 6719915 Country: United States Status: Filed on 19-Jul-2001, Issued on 13-Apr-2004 Organization: ...
URL: https://www.src.org/library/patent/p0264/
Modified: 2004-04-13 - 25KB
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- 8:
Step and Flash Imprint Lithography (Patent P0245) - SRC
- Step and Flash Imprint Lithography Application Type: European Patent Office Patent Number: 1228401 Status: Filed on 3-Mar-2000, Issued on 10-Aug-2005 Organization: University of ...
URL: https://www.src.org/library/patent/p0245/
Modified: 2005-08-10 - 25KB
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- 9:
Step and Flash Imprint Lithography (Patent P0238) - SRC
- Step and Flash Imprint Lithography Application Type: Utility Patent Number: 6334960 Country: United States Status: Filed on 11-Mar-1999, Issued on 1-Jan-2002, Patent Expired ...
URL: https://www.src.org/library/patent/p0238/
Modified: 2002-01-01 - 25KB
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- 10:
Step and Flash Imprint Lithography (Patent P0233) - SRC
- Step and Flash Imprint Lithography Application Type: Foreign National Patent Number: WO2000054107 A Country: Japan Status: Filed on 3-Mar-2000, Issued on 2-May-2000, Patent Expired ...
URL: https://www.src.org/library/patent/p0233/
Modified: 2000-05-02 - 25KB
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- 11:
Methods and Compositions for Forming Patterns with Isolated or...
- Methods and Compositions for Forming Patterns with Isolated or Discrete Features Using Block Coplymer Materials Application Type: Divisional Patent Number: 8501304 Country: United ...
URL: https://www.src.org/library/patent/p1333/
Modified: 2013-08-06 - 25KB
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- 12:
Methods and Compositions for Forming Patterns with Isolated or...
- Methods and Compositions for Forming Patterns with Isolated or Discrete Features Using Block Copolymer Materials Application Type: Utility Patent Number: 8133534 Country: United ...
URL: https://www.src.org/library/patent/p1043/
Modified: 2012-03-13 - 25KB
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- 13:
Multiple Copolymer Systems as Templates for Block Copolymer Nanolithog...
- Multiple Copolymer Systems as Templates for Block Copolymer Nanolithography Application Type: Utility Patent Number: 9798232 Country: United States Status: Filed on 17-Oct-2014, ...
URL: https://www.src.org/library/patent/p1504/
Modified: 2017-10-24 - 23KB
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- 14:
Phase-Shifting Test Mask Patterns for Characterizing Illumination...
- Phase-Shifting Test Mask Patterns for Characterizing Illumination and Mask Quality in Image Forming Optical Systems Application Type: Utility Patent Number: 7648802 Country: United ...
URL: https://www.src.org/library/patent/p0514/
Modified: 2010-01-19 - 23KB
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- 15:
Fabrication of Complex Three-Dimensional Structures Based on...
- Fabrication of Complex Three-Dimensional Structures Based on Directed Assembly of Self-Assembling Materials on Activated Two-Dimensional Templates Application Type: Continuation ...
URL: https://www.src.org/library/patent/p1446/
Modified: 2017-01-10 - 27KB
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- 16:
Fabrication of Complex Three-Dimensional Structures Based on...
- Fabrication of Complex Three-Dimensional Structures Based on Directed Assembly of Self-Assembling Materials On Activated Two-Dimensional Templates Application Type: Continuation ...
URL: https://www.src.org/library/patent/p1340/
Modified: 2014-01-07 - 27KB
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- 17:
Fabrication of Complex Three-Dimensional Structures Based on...
- Fabrication of Complex Three-Dimensional Structures Based on Directed Assembly of Self-Assembling Materials On Activated Two-Dimensional Templates Application Type: Utility Patent ...
URL: https://www.src.org/library/patent/p0603/
Modified: 2012-05-01 - 27KB
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- 18:
Methods and Systems for Transmission and Detection of Free Radicals...
- Methods and Systems for Transmission and Detection of Free Radicals Application Type: Utility Patent Number: 11592394 Country: United States Status: Filed on 14-Aug-2017, Issued on ...
URL: https://www.src.org/library/patent/p2131/
Modified: 2023-12-28 - 22KB
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- 19:
Orientation-Controlled Self-Assembled Nanolithography Using a...
- Orientation-Controlled Self-Assembled Nanolithography Using a Block Copolymer Application Type: Utility Patent Number: 8147914 Country: United States Status: Filed on 11-Jun-2008, ...
URL: https://www.src.org/library/patent/p1079/
Modified: 2012-04-03 - 23KB
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- 20:
Formation of Close-Packed Sphere Arrays in V-Shaped Grooves ...
- Formation of Close-Packed Sphere Arrays in V-Shaped Grooves Application Type: Utility Patent Number: 7790045 Country: United States Status: Filed on 13-Sep-2007, Issued on ...
URL: https://www.src.org/library/patent/p1038/
Modified: 2010-09-07 - 24KB
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- 21:
Formation of Close-Packed Sphere Arrays in V-Shaped Grooves ...
- Formation of Close-Packed Sphere Arrays in V-Shaped Grooves Application Type: Divisional Patent Number: 8163374 Country: United States Status: Filed on 7-Jun-2010, Issued on ...
URL: https://www.src.org/library/patent/p1216/
Modified: 2012-04-24 - 24KB
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- 22:
Self-Assembly Technique Applicable to Large Areas and Nanofabrication...
- Self-Assembly Technique Applicable to Large Areas and Nanofabrication Application Type: Utility Country: United States Status: Filed on 26-Sep-2008, Patent Abandoned Organization: ...
URL: https://www.src.org/library/patent/p1137/
Modified: 2008-09-26 - 23KB
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- 23:
Multiple-Thickness Gate Oxide Formed by Oxygen Implantation ...
- Multiple-Thickness Gate Oxide Formed by Oxygen Implantation - Method claims Application Type: Utility Patent Number: 6753229 Country: United States Status: Filed on 24-Nov-1999, ...
URL: https://www.src.org/library/patent/p0086/
Modified: 2004-06-22 - 26KB
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- 24:
Multiple-Thickness Gate Oxide Formed by Oxygen Implantation ...
- Multiple-Thickness Gate Oxide Formed by Oxygen Implantation Application Type: Foreign National Patent Number: NI154458 Country: Taiwan Status: Filed on 1-Dec-1999, Issued on ...
URL: https://www.src.org/library/patent/p0211/
Modified: 2003-05-07 - 26KB
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- 25:
Guided Self-Assembly of Block Copolymer Line Structures for Integrated...
- Guided Self-Assembly of Block Copolymer Line Structures for Integrated Circuit Interconnects Application Type: Utility Patent Number: 8309278 Country: United States Status: Filed ...
URL: https://www.src.org/library/patent/p1242/
Modified: 2012-11-13 - 24KB
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- 26:
DENSITY MULTIPLICATION AND IMPROVED LITHOGRAPHY BY DIRECTED BLOCK...
- DENSITY MULTIPLICATION AND IMPROVED LITHOGRAPHY BY DIRECTED BLOCK COPOLYMER ASSEMBLY Application Type: Patent Cooperation Treaty Patent Number: 10438626 Status: Filed on ...
URL: https://www.src.org/library/patent/p1132/
Modified: 2010-04-17 - 26KB
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- 27:
Density Multiplication and Improved Lithography by Directed Block...
- Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly Application Type: Utility Patent Number: 9183870 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p1116/
Modified: 2015-11-10 - 26KB
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- 28:
NMS Patterning Review Agenda
- NMS Patterning Review Agenda Date: Tuesday, October 4, 2011 - Thursday, October 6, 2011 Location: The Solution Center, Durham, NC 27703 Tuesday, October 4, 2011 7:30 - 8:30 a.m. ...
URL: https://www.src.org/calendar/e004187/e004187-agenda.pdf
Modified: 2011-09-22 - 44KB
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