Questions?
[x] GRC Science Area
LIT – Lithography Sciences

Content Type
Patent Filings 41
Other 1

SRC Program
GRC 42

Center
ACE4S 1
CAIST 1
CDADIC 1
CEMPI 1
CHIRP 1
EBSM 1
IPC 1
NCRC 1
TxACE 1

Thrust/Theme
PAT – Patterning 13
Pat(MPS) – Patterning 13
PatMat – Patterning Materials 7
CFM&TCM – CFM & Total Chemical M... 6
MTMP – Metrology Tools Matls & P... 4
Masks 4
Metrology 2
ADS – Alternative Device Structu... 1
AIHW – Artificial Intelligence H... 1
AMS – Analog and Mixed-Signal De... 1
AMS-CSD – Analog/Mixed-Signal Ci... 1
AdvTech – Advanced Technology 1
Advanced Bipolar SOI-MOS Transis... 1
Advanced Devices 1
Advanced Devices & Technologies 1
Advanced Technology Option 1
Analysis Design & Simulation 1
BEP – Back End Processes 1
Back End Processes 1
C&S – Controls and Sensing 1
CADT – Computer-Aided Design and... 1
CD – Circuit Design 1
CM – Compact Modeling 1
CSR – Cross-Disciplinary Semicon... 1
Contamination Control 1
Cost Reduction 1
DCMOS – Digital CMOS Technologie... 1
DE – Design Environment 1
DSMS – Device Sciences Modeling ... 1
DV – Design Verification 1
Defect Reduction 1
Deposition 1
DesSyn – Design Synthesis 1
DesTech – Design Techniques 1
Doping Technologies 1
EP3C – Efficiency and Performanc... 1
ESH – Environment Safety and Hea... 1
Equip Automation & Process Contr... 1
Equip – Equipment 1
Equip. Auto. and Process Control 1
FACSYS – Factory Systems 1
FAM – Factory Automation & Manag... 1
FEOL – FEOL Processes 1
FacOps – Factory Operations 1
Factory Systems 1
Front End Processes 1
HWS – Hardware Security 1
Heat Signal & Power Distribution 1
Heat Signal Power 1
I3T – Innovative and Intelligent... 1
ISD – Integrated System Design 1
Interconnect Architecture 1
LMD – Logic and Memory Devices 1
LPD – Logic & Physical Design 1
Lithography 1
Logic Design 1
Logistics & Modeling/Simulation 1
MT – Memory Technologies 1
Materials 1
Materials & Measurements 1
Modeling & Simulation 1
Modeling & TCAD 1
Multi-level Interconnect 1
NCR – Non-Classical CMOS Researc... 1
NEM – Nanoengineered Materials 1
NMP – Nanomanufacturing Material... 1
PKG – Packaging 1
PMM – Packaging Materials and Me... 1
PMS – Packaging Modeling and Sim... 1
PS/E – Process Simplification/En... 1
Package & Electrical Design 1
Package Reliability 1
Packaging & Interconnect Systems 1
Packaging Materials Interfaces 1
PatSys – Patterning Systems 1
PhyDes – Physical Design 1
Physical Design 1
Plasma Etch 1
Process Architecture 1
Processes – Processes 1
Quality & Reliability 1
Rapid Yield Learning 1
Reliability 1
Resist 1
SLD – System Level Design 1
SemiSynBio – Semiconductor Synth... 1
Semiconductor Modeling & Simulat... 1
Signal/Power Management 1
Substrates 1
Synthesis & Verification 1
TCAD-MBPS 1
TM – Thermal Management 1
TT – Test & Testability 1
TechCAD – Technology CAD 1
VER – Verification 1

1 through 30 of 42 similar documents, best matches first.   
Results by:Thunderstone Page: 1 2 next >>
1: Semiconductor Research Corporation - SRC
GRC GRC Global Research Collaboration Our motivation is to fund the most relevant and critical research for international companies, so we go where the best university talent ...
URL: https://www.src.org/program/grc/
Modified: 2023-10-10 - 33KB
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2: Patterning Methods and Systems Using Reflected Interference Patterns...
Patterning Methods and Systems Using Reflected Interference Patterns Application Type: Continuation Patent Number: 6967067 Country: United States Status: Filed on 9-Mar-2004, ...
URL: https://www.src.org/library/patent/p0428/
Modified: 2005-11-22 - 22KB
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3: Stress-Free Mount for Imaging Mask (Patent P0056) - SRC
Stress-Free Mount for Imaging Mask Application Type: Divisional Patent Number: 5675403 Country: United States Status: Filed on 28-May-1996, Issued on 7-Oct-1997, Patent Expired ...
URL: https://www.src.org/library/patent/p0056/
Modified: 1997-10-07 - 24KB
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4: Stress-Free Mount for Imaging Mask (Patent P0076) - SRC
Stress-Free Mount for Imaging Mask Application Type: Utility Patent Number: 5536559 Country: United States Status: Filed on 22-Nov-1994, Issued on 16-Jul-1996, Patent Expired ...
URL: https://www.src.org/library/patent/p0076/
Modified: 1996-07-16 - 24KB
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5: Patterning Methods and Systems Using Reflected Interference Patterns...
Patterning Methods and Systems Using Reflected Interference Patterns Application Type: Utility Patent Number: 6730443 Country: United States Status: Filed on 12-Feb-2001, Issued on ...
URL: https://www.src.org/library/patent/p0195/
Modified: 2004-05-04 - 22KB
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6: Patterning Methods and Systems Using Reflected Interference Patterns...
Patterning Methods and Systems Using Reflected Interference Patterns Application Type: Foreign National Patent Number: NI-154578 Country: Taiwan Status: Filed on 21-Feb-2001, ...
URL: https://www.src.org/library/patent/p0267/
Modified: 2002-05-01 - 22KB
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7: Langmuir Probe System for Radio Frequency Excited Plasma Processing...
Langmuir Probe System for Radio Frequency Excited Plasma Processing System Application Type: Utility Patent Number: 5339039 Country: United States Status: Filed on 29-Sep-1992, ...
URL: https://www.src.org/library/patent/p0130/
Modified: 1994-08-16 - 22KB
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8: Twin Mask, and Method and System for Using Same to Pattern Microelectr...
Twin Mask, and Method and System for Using Same to Pattern Microelectronic Substrates Application Type: Utility Patent Number: 5438204 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p0034/
Modified: 1995-08-01 - 22KB
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9: Systems, Methods and Computer Program Products for Detecting...
Systems, Methods and Computer Program Products for Detecting the Position of a New Alignment Mark on a Substrate Based on Fitting to Sample Alignment Signals Application Type: ...
URL: https://www.src.org/library/patent/p0047/
Modified: 2000-05-16 - 22KB
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10: Fabrication of Group III-Nitride Photocathode Having Cs Activation...
Fabrication of Group III-Nitride Photocathode Having Cs Activation Layer Application Type: Continuation (in part) Patent Number: 7455565 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p1082/
Modified: 2008-11-25 - 23KB
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11: Multiple-Thickness Gate Oxide Formed by Oxygen Implantation ...
Multiple-Thickness Gate Oxide Formed by Oxygen Implantation Application Type: Foreign National Patent Number: NI154458 Country: Taiwan Status: Filed on 1-Dec-1999, Issued on ...
URL: https://www.src.org/library/patent/p0211/
Modified: 2003-05-07 - 26KB
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12: Optical Proximity Correction Using Regression (Patent P1118)...
Optical Proximity Correction Using Regression Application Type: Utility Patent Number: 8201110 Country: United States Status: Filed on 14-Apr-2009, Issued on 12-Jun-2012, Patent ...
URL: https://www.src.org/library/patent/p1118/
Modified: 2012-06-12 - 24KB
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13: Step and Flash Imprint Lithography (Patent P0264) - SRC
Step and Flash Imprint Lithography Application Type: Utility Patent Number: 6719915 Country: United States Status: Filed on 19-Jul-2001, Issued on 13-Apr-2004 Organization: ...
URL: https://www.src.org/library/patent/p0264/
Modified: 2004-04-13 - 25KB
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14: Step and Flash Imprint Lithography (Patent P0245) - SRC
Step and Flash Imprint Lithography Application Type: European Patent Office Patent Number: 1228401 Status: Filed on 3-Mar-2000, Issued on 10-Aug-2005 Organization: University of ...
URL: https://www.src.org/library/patent/p0245/
Modified: 2005-08-10 - 25KB
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15: Step and Flash Imprint Lithography (Patent P0238) - SRC
Step and Flash Imprint Lithography Application Type: Utility Patent Number: 6334960 Country: United States Status: Filed on 11-Mar-1999, Issued on 1-Jan-2002, Patent Expired ...
URL: https://www.src.org/library/patent/p0238/
Modified: 2002-01-01 - 25KB
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16: Step and Flash Imprint Lithography (Patent P0233) - SRC
Step and Flash Imprint Lithography Application Type: Foreign National Patent Number: WO2000054107 A Country: Japan Status: Filed on 3-Mar-2000, Issued on 2-May-2000, Patent Expired ...
URL: https://www.src.org/library/patent/p0233/
Modified: 2000-05-02 - 25KB
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17: Water-Processable Photoresist Compositions (Patent P0186) - SRC
Water-Processable Photoresist Compositions Application Type: Utility Patent Number: 6399273 Country: United States Status: Filed on 14-Aug-2000, Issued on 4-Jun-2002, Patent ...
URL: https://www.src.org/library/patent/p0186/
Modified: 2002-06-04 - 26KB
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18: Multiple-Thickness Gate Oxide Formed by Oxygen Implantation ...
Multiple-Thickness Gate Oxide Formed by Oxygen Implantation - device claims Application Type: Utility Patent Number: 6855994 Country: United States Status: Filed on 5-Sep-2001, ...
URL: https://www.src.org/library/patent/p0259/
Modified: 2005-02-15 - 26KB
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19: Water-Processable Photoresist Compositions (Patent P0272) - SRC
Water-Processable Photoresist Compositions Application Type: Foreign National Patent Number: 2001-517217 Country: Japan Status: Filed on 14-Aug-2000, Issued on 5-Feb-2005 ...
URL: https://www.src.org/library/patent/p0272/
Modified: 2005-02-05 - 26KB
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20: Water-Processable Photoresist Compositions (Patent P0282) - SRC
Water-Processable Photoresist Compositions Application Type: European Patent Office Patent Number: EP1240552 Status: Filed on 14-Aug-2000, Issued on 8-Sep-2005, Patent Abandoned ...
URL: https://www.src.org/library/patent/p0282/
Modified: 2005-09-08 - 26KB
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21: Multiple-Thickness Gate Oxide Formed by Oxygen Implantation ...
Multiple-Thickness Gate Oxide Formed by Oxygen Implantation - Method claims Application Type: Utility Patent Number: 6753229 Country: United States Status: Filed on 24-Nov-1999, ...
URL: https://www.src.org/library/patent/p0086/
Modified: 2004-06-22 - 26KB
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22: Using Block Copolymers as Supercritical Fluid Developable Photoresists...
Using Block Copolymers as Supercritical Fluid Developable Photoresists Application Type: Utility Patent Number: 6379874 Country: United States Status: Filed on 26-Oct-1999, Issued ...
URL: https://www.src.org/library/patent/p0097/
Modified: 2002-04-30 - 22KB
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23: Water-Soluble Photoinitiators (Patent P0013) - SRC
Water-Soluble Photoinitiators Application Type: Utility Patent Number: 5648196 Country: United States Status: Filed on 14-Jul-1995, Issued on 15-Jul-1997, Patent Expired ...
URL: https://www.src.org/library/patent/p0013/
Modified: 1997-07-15 - 24KB
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24: Methods and Compositions for Imaging Acids in Chemically Amplified...
Methods and Compositions for Imaging Acids in Chemically Amplified Photoresists Using pH-Dependent Fluorophores Application Type: Divisional Patent Number: 6566030 Country: United ...
URL: https://www.src.org/library/patent/p0224/
Modified: 2003-05-20 - 23KB
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25: Methods and Compositions for Imaging Acids in Chemically Amplified...
Methods and Compositions for Imaging Acids in Chemically Amplified Photoresists Using pH-Dependent Fluorophores Application Type: Utility Patent Number: 6376149 Country: United ...
URL: https://www.src.org/library/patent/p0088/
Modified: 2002-04-23 - 23KB
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26: Double Hidden Flexure Microactuator for Phase Mirror Array (Patent...
Double Hidden Flexure Microactuator for Phase Mirror Array Application Type: Utility Patent Number: 7075699 Country: United States Status: Filed on 28-Sep-2004, Issued on ...
URL: https://www.src.org/library/patent/p0508/
Modified: 2006-07-11 - 22KB
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27: Attenuated Phase Shift Mask and a Method for Making the Mask...
Attenuated Phase Shift Mask and a Method for Making the Mask Application Type: Utility Patent Number: 6309780 Country: United States Status: Filed on 15-Jun-1999, Issued on ...
URL: https://www.src.org/library/patent/p0380/
Modified: 2001-10-30 - 22KB
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28: Multi-Layered Attenuated Phase Shift Mask and a Method for Making...
Multi-Layered Attenuated Phase Shift Mask and a Method for Making the Mask Application Type: Utility Patent Number: 5939227 Country: United States Status: Filed on 9-Mar-1998, ...
URL: https://www.src.org/library/patent/p0052/
Modified: 1999-08-17 - 30KB
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29: Method and Apparatus for Real-Time Speckle Interferometry for...
Method and Apparatus for Real-Time Speckle Interferometry for Strain or Displacement of an Object Surface Application Type: Utility Patent Number: 5426498 Country: United States ...
URL: https://www.src.org/library/patent/p0038/
Modified: 1995-06-20 - 21KB
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30: Methods for Decreasing Surface Roughness in Novolak-Based Resists...
Methods for Decreasing Surface Roughness in Novolak-Based Resists Application Type: Utility Patent Number: 6162592 Country: United States Status: Filed on 6-Oct-1998, Issued on ...
URL: https://www.src.org/library/patent/p0164/
Modified: 2000-12-19 - 22KB
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1 through 30 of 42 similar documents, best matches first.   
Results by:Thunderstone Page: 1 2 next >>