Questions?
[x] GRC Science Area
MPS – Material & Process Sciences

Content Type
Patent Filings 27
Other 1

SRC Program
GRC 28
FCRP 2

Center
EBSM 4
FENA 2
ACE4S 1
CAIST 1
CDADIC 1
CEMPI 1
CHIRP 1
IPC 1
NCRC 1
TxACE 1

Thrust/Theme
Factory Systems 9
PAT – Patterning 9
ESH – Environment Safety and Hea... 4
BEP – Back End Processes 3
Back End Processes 3
Pat(MPS) – Patterning 3
DCMOS – Digital CMOS Technologie... 2
ADS – Alternative Device Structu... 1
AIHW – Artificial Intelligence H... 1
AMS – Analog and Mixed-Signal De... 1
AMS-CSD – Analog/Mixed-Signal Ci... 1
AdvTech – Advanced Technology 1
Advanced Bipolar SOI-MOS Transis... 1
Advanced Devices 1
Advanced Devices & Technologies 1
Advanced Technology Option 1
Analysis Design & Simulation 1
C&S – Controls and Sensing 1
CADT – Computer-Aided Design and... 1
CD – Circuit Design 1
CFM&TCM – CFM & Total Chemical M... 1
CM – Compact Modeling 1
CSR – Cross-Disciplinary Semicon... 1
Contamination Control 1
Cost Reduction 1
DE – Design Environment 1
DSMS – Device Sciences Modeling ... 1
DV – Design Verification 1
Defect Reduction 1
Deposition 1
DesSyn – Design Synthesis 1
DesTech – Design Techniques 1
Doping Technologies 1
EP3C – Efficiency and Performanc... 1
Equip Automation & Process Contr... 1
Equip – Equipment 1
Equip. Auto. and Process Control 1
FACSYS – Factory Systems 1
FAM – Factory Automation & Manag... 1
FEOL – FEOL Processes 1
FacOps – Factory Operations 1
Front End Processes 1
HWS – Hardware Security 1
Heat Signal & Power Distribution 1
Heat Signal Power 1
I3T – Innovative and Intelligent... 1
ISD – Integrated System Design 1
Interconnect Architecture 1
LMD – Logic and Memory Devices 1
LPD – Logic & Physical Design 1
Lithography 1
Logic Design 1
Logistics & Modeling/Simulation 1
MT – Memory Technologies 1
MTMP – Metrology Tools Matls & P... 1
Masks 1
Materials 1
Materials & Measurements 1
Metrology 1
Modeling & Simulation 1
Modeling & TCAD 1
Multi-level Interconnect 1
NCR – Non-Classical CMOS Researc... 1
NEM – Nanoengineered Materials 1
NMP – Nanomanufacturing Material... 1
PKG – Packaging 1
PMM – Packaging Materials and Me... 1
PMS – Packaging Modeling and Sim... 1
PS/E – Process Simplification/En... 1
Package & Electrical Design 1
Package Reliability 1
Packaging & Interconnect Systems 1
Packaging Materials Interfaces 1
PatMat – Patterning Materials 1
PatSys – Patterning Systems 1
PhyDes – Physical Design 1
Physical Design 1
Plasma Etch 1
Process Architecture 1
Processes – Processes 1
Quality & Reliability 1
Rapid Yield Learning 1
Reliability 1
Resist 1
SLD – System Level Design 1
SemiSynBio – Semiconductor Synth... 1
Semiconductor Modeling & Simulat... 1
Signal/Power Management 1
Substrates 1
Synthesis & Verification 1
TCAD-MBPS 1
TM – Thermal Management 1
TT – Test & Testability 1
TechCAD – Technology CAD 1
VER – Verification 1

1 through 28 of 28 similar documents, best matches first.   
1: Semiconductor Research Corporation - SRC
GRC GRC Global Research Collaboration Our motivation is to fund the most relevant and critical research for international companies, so we go where the best university talent ...
URL: https://www.src.org/program/grc/
Modified: 2023-10-10 - 33KB
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2: High/Low Work Function Metal Alloys for Integrated Circuit Electrodes...
High/Low Work Function Metal Alloys for Integrated Circuit Electrodes and Methods of Fabricating Same Application Type: Utility Patent Number: 6873020 Country: United States ...
URL: https://www.src.org/library/patent/p0243/
Modified: 2005-03-29 - 22KB
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3: Molecular Glass Photoresists (Patent P0566) - SRC
Molecular Glass Photoresists Application Type: Utility Patent Number: 7452658 Country: United States Status: Filed on 16-Feb-2006, Issued on 18-Nov-2008, Patent Abandoned ...
URL: https://www.src.org/library/patent/p0566/
Modified: 2008-11-18 - 23KB
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4: Using Block Copolymers as Supercritical Fluid Developable Photoresists...
Using Block Copolymers as Supercritical Fluid Developable Photoresists Application Type: Utility Patent Number: 6379874 Country: United States Status: Filed on 26-Oct-1999, Issued ...
URL: https://www.src.org/library/patent/p0097/
Modified: 2002-04-30 - 22KB
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5: Growth of Inorganic Thin Films using Self-Assembled Monolayers...
Growth of Inorganic Thin Films using Self-Assembled Monolayers as Nucleation Sites Application Type: Utility Patent Number: 7829150 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p1139/
Modified: 2010-11-09 - 22KB
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6: Massively Parallel Addressable Array Cathode (Patent P0260) ...
Massively Parallel Addressable Array Cathode Application Type: Utility Patent Number: 5363021 Country: United States Status: Filed on 12-Jul-1993, Issued on 8-Nov-1994, Patent ...
URL: https://www.src.org/library/patent/p0260/
Modified: 1994-11-08 - 20KB
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7: Method for Patterning a Radiation Sensitive Layer (Patent P0087...
Method for Patterning a Radiation Sensitive Layer Application Type: Utility Patent Number: 6509138 Country: United States Status: Filed on 12-Jan-2000, Issued on 21-Jan-2003 ...
URL: https://www.src.org/library/patent/p0087/
Modified: 2003-01-21 - 22KB
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8: Solventless, Resistless, Direct Dielectric Patterning (Patent...
Solventless, Resistless, Direct Dielectric Patterning Application Type: Foreign National Patent Number: 171285 Country: Taiwan Status: Filed on 9-Jan-2001, Issued on 2-Jun-2003, ...
URL: https://www.src.org/library/patent/p0207/
Modified: 2003-06-02 - 22KB
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9: Solventless, Resistless, Direct Dielectric Patterning (Patent...
Solventless, Resistless, Direct Dielectric Patterning Application Type: European Patent Office Patent Number: 1269259 Status: Filed on 11-Jan-2001, Issued on 8-Aug-2012, Patent ...
URL: https://www.src.org/library/patent/p0308/
Modified: 2012-08-08 - 22KB
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10: Capacitorless Dram Device on Silicon-On-Insulator Substrate ...
Capacitorless Dram Device on Silicon-On-Insulator Substrate Application Type: Utility Patent Number: 5448513 Country: United States Status: Filed on 2-Dec-1993, Issued on ...
URL: https://www.src.org/library/patent/p0032/
Modified: 1995-09-05 - 25KB
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11: Capacitorless Dram Device on Silicon-On-Insulator Substrate ...
Capacitorless Dram Device on Silicon-On-Insulator Substrate Application Type: European Patent Office Patent Number: 694291064 Status: Filed on 1-Dec-1994, Issued on 14-Nov-2001, ...
URL: https://www.src.org/library/patent/p0287/
Modified: 2001-11-14 - 25KB
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12: Capacitorless Dram Device on Silicon-On-Insulator Substrate ...
Capacitorless Dram Device on Silicon-On-Insulator Substrate Application Type: European Patent Office Patent Number: 0731972 Status: Filed on 1-Dec-1994, Issued on 14-Nov-2001, ...
URL: https://www.src.org/library/patent/p0234/
Modified: 2001-11-14 - 25KB
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13: Multiple-Thickness Gate Oxide Formed by Oxygen Implantation ...
Multiple-Thickness Gate Oxide Formed by Oxygen Implantation - device claims Application Type: Utility Patent Number: 6855994 Country: United States Status: Filed on 5-Sep-2001, ...
URL: https://www.src.org/library/patent/p0259/
Modified: 2005-02-15 - 26KB
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14: Lanthanum Oxide-Based Gate Dielectrics for Integrated Circuit...
Lanthanum Oxide-Based Gate Dielectrics for Integrated Circuit Field Effect Transistors and Methods of Fabricating Same Application Type: Divisional Patent Number: 6753567 Country: ...
URL: https://www.src.org/library/patent/p0375/
Modified: 2004-06-22 - 22KB
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15: Lanthanum Oxide-Based Gate Dielectrics for Integrated Circuit...
Lanthanum Oxide-Based Gate Dielectrics for Integrated Circuit Field Effect Transistors and Methods of Fabricating Same Application Type: Utility Patent Number: 6531354 Country: ...
URL: https://www.src.org/library/patent/p0194/
Modified: 2003-03-11 - 22KB
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16: Lanthanum Oxide-Based Gate Dielectrics for Integrated Circuit...
Lanthanum Oxide-Based Gate Dielectrics for Integrated Circuit Field Effect Transistors and Methods of Fabricating Same Application Type: Foreign National Patent Number: NI154861 ...
URL: https://www.src.org/library/patent/p0580/
Modified: 2008-12-01 - 22KB
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17: Organoelement Resists for EUV Lithography and Methods of Making...
Organoelement Resists for EUV Lithography and Methods of Making the Same Application Type: Utility Patent Number: 7326514 Country: United States Status: Filed on 12-Mar-2004, ...
URL: https://www.src.org/library/patent/p0446/
Modified: 2008-02-05 - 22KB
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18: Systems, Methods and Computer Program Products for Detecting...
Systems, Methods and Computer Program Products for Detecting the Position of a New Alignment Mark on a Substrate Based on Fitting to Sample Alignment Signals Application Type: ...
URL: https://www.src.org/library/patent/p0047/
Modified: 2000-05-16 - 22KB
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19: Multiple Copper Vias for Integrated Circuit Metallization and...
Multiple Copper Vias for Integrated Circuit Metallization and Methods of Fabricating Same Application Type: Utility Patent Number: 6919639 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p0268/
Modified: 2005-07-19 - 22KB
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20: Method of Forming Boron Carbo-Nitride Layers for Integrated Circuit...
Method of Forming Boron Carbo-Nitride Layers for Integrated Circuit Devices Application Type: Utility Patent Number: 7144803 Country: United States Status: Filed on 16-Apr-2004, ...
URL: https://www.src.org/library/patent/p0451/
Modified: 2006-12-05 - 22KB
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21: Multiple Copper Vias for Intergrated Circuit Metallization (Patent...
Multiple Copper Vias for Intergrated Circuit Metallization Application Type: Continuation Patent Number: 7078817 Country: United States Status: Filed on 13-Dec-2004, Issued on ...
URL: https://www.src.org/library/patent/p0521/
Modified: 2006-07-18 - 22KB
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22: Molecular Transfer Printing Using Block Copolymers (Patent P1163...
Molecular Transfer Printing Using Block Copolymers Application Type: Utility Patent Number: 8133341 Country: United States Status: Filed on 1-Apr-2009, Issued on 13-Mar-2012, ...
URL: https://www.src.org/library/patent/p1163/
Modified: 2012-03-13 - 26KB
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23: Molecular Transfer Printing Using Block Copolymers (Patent P1181...
Molecular Transfer Printing Using Block Copolymers Application Type: Patent Cooperation Treaty Patent Number: PCT/US20090392 Status: Filed on 14-May-2009, Issued on 26-Feb-2011, ...
URL: https://www.src.org/library/patent/p1181/
Modified: 2011-02-26 - 26KB
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24: CHARACTERIZING ABERRATIONS IN AN IMAGING LENS AND APPLICATIONS...
CHARACTERIZING ABERRATIONS IN AN IMAGING LENS AND APPLICATIONS TO VISUAL TESTING AND INTEGRATED CIRCUIT MASK ANALYSIS Application Type: Utility Patent Number: 7030997 Country: ...
URL: https://www.src.org/library/patent/p0302/
Modified: 2006-04-18 - 22KB
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25: Dual Work Function CMOS Gate Technology Based on Metal Interdiffusion...
Dual Work Function CMOS Gate Technology Based on Metal Interdiffusion Application Type: Divisional Patent Number: 7141858 Country: United States Status: Filed on 18-Jun-2004, ...
URL: https://www.src.org/library/patent/p0482/
Modified: 2006-11-28 - 22KB
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26: Dual Work Function CMOS Gate Technology Based on Metal Interdiffusion...
Dual Work Function CMOS Gate Technology Based on Metal Interdiffusion Application Type: Utility Patent Number: 6794234 Country: United States Status: Filed on 9-Dec-2002, Issued on ...
URL: https://www.src.org/library/patent/p0295/
Modified: 2004-09-21 - 22KB
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27: Multiple-Thickness Gate Oxide Formed by Oxygen Implantation ...
Multiple-Thickness Gate Oxide Formed by Oxygen Implantation - Method claims Application Type: Utility Patent Number: 6753229 Country: United States Status: Filed on 24-Nov-1999, ...
URL: https://www.src.org/library/patent/p0086/
Modified: 2004-06-22 - 26KB
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28: Multiple-Thickness Gate Oxide Formed by Oxygen Implantation ...
Multiple-Thickness Gate Oxide Formed by Oxygen Implantation Application Type: Foreign National Patent Number: NI154458 Country: Taiwan Status: Filed on 1-Dec-1999, Issued on ...
URL: https://www.src.org/library/patent/p0211/
Modified: 2003-05-07 - 26KB
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1 through 28 of 28 similar documents, best matches first.