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Patent Filings
SRC Program
GRC 553
FCRP 174
STARnet 102
JUMP 49
NRI 41
nCORE 22
MSR-Intel 4
ERI 1
Center
IFC 72
C-SPIN 40
TxACE 33
C2S2 32
FENA 29
GSRC 25
ACE4S 22
ASCENT 22
LEAST 20
C-FAR 17
MSD 16
FAME 14
SWAN 12
CRISP 11
SONIC 9
CNFD 8
WIN 7
AMML 6
CBRIC 6
CONIX 5
IMPACT 5
MIND 5
NEWLIMITS 5
ComSenTer 4
EBSM 4
ADA 3
Benchmarking 3
CEMPI 3
DEEP3M 3
E2CDA-NRI 3
INDEX 3
TerraSwarm 3
CAIST 2
CAPSL 1
CHIRP 1
E2CDA 1
MuSyC 1
NCRC 1
NRI-NSF 1
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Thrust/Theme
CD – Circuit Design 59
PAT – Patterning 43
TT – Test & Testability 35
Advanced Devices & Technologies 26
SLD – System Level Design 23
AMS-CSD – Analog/Mixed-Signal Ci... 22
I3T – Innovative and Intelligent... 22
HWS – Hardware Security 21
ISD – Integrated System Design 21
LPD – Logic & Physical Design 19
CADT – Computer-Aided Design and... 17
Factory Systems 17
NMP – Nanomanufacturing Material... 15
Pat(MPS) – Patterning 15
PKG – Packaging 14
BEP – Back End Processes 13
NEM – Nanoengineered Materials 13
ASCENT-T1 – Vertical CMOS 12
CRISP-T1 – Hardware Support for ... 9
ADS – Alternative Device Structu... 8
ASCENT-T2 – Beyond CMOS 8
DCMOS – Digital CMOS Technologie... 8
Back End Processes 7
AMML-T1 – Antiferromagnetic Magn... 6
DesTech – Design Techniques 6
Doping Technologies 6
MT – Memory Technologies 6
PatMat – Patterning Materials 6
CFM&TCM – CFM & Total Chemical M... 5
CONIX-T1 – ARENA Integrator 5
VER – Verification 5
CBRIC-T2 – Neuromorphic Fabrics 4
ESH – Environment Safety and Hea... 4
IMPACT-T1 – Materials for Scaled... 4
Packaging & Interconnect Systems 4
Physical Design 4
TechCAD – Technology CAD 4
ADA-T1 – Deft Development 3
AIHW – Artificial Intelligence H... 3
DEEP3M-T4 – Architectures 3
Lithography 3
MTMP – Metrology Tools Matls & P... 3
Masks 3
Materials 3
Modeling & Simulation 3
SemiSynBio – Semiconductor Synth... 3
CBRIC-T1 – Neuro-inspired Algori... 2
CRISP-T3 – Scaling Applications ... 2
ComSenTer-T1 – Systems and Algor... 2
DesSyn – Design Synthesis 2
LMD – Logic and Memory Devices 2
Multi-level Interconnect 2
NEWLIMITS-T2 – 2D Materials Devi... 2
Processes – Processes 2
AMS – Analog and Mixed-Signal De... 1
ASCENT-T4 – Merged Logic Memory ... 1
AdvTech – Advanced Technology 1
C&S – Controls and Sensing 1
CAPSL-T4 – Architectures and Sys... 1
CM – Compact Modeling 1
ComSenTer-T2 – mm-wave/THz ICs a... 1
ComSenTer-T3 – Application-speci... 1
DEEP3M-T2 – Circuits 1
DV – Design Verification 1
Deposition 1
E2CDA2 – E2CDA 2.0 1
Front End Processes 1
IMPACT-T2 – Materials for Storag... 1
Metrology 1
NEWLIMITS-T1 – Novel Computing a... 1
NEWLIMITS-T3 – Advanced Manufact... 1
NEWLIMITS-T4 – Characterization ... 1
Reliability 1
SMART-T1 – Spin-orbit Torque Mat... 1
Synthesis & Verification 1
GRC Science Area
MPS – Material & Process Science... 119
NIS – Nanostructure & Integratio... 100
ICSS – Integrated Circuit & Syst... 92
CADTS – Computer Aided Design & ... 82
NMS – Nanomanufacturing Sciences 82
LIT – Lithography Sciences 41
DS – Device Sciences 33
IPS – Interconnect & Packaging S... 32
MIC – Microstructure Sciences 32
DES – Design Sciences 30
PID – Process Integration & Devi... 28
MBP – Materials & Bulk Processes... 23
INT – Interconnect Sciences 11
MFGPS – Manufacturing Process Sc... 4
ES-H – Environmental Safety & He... 3
FAC – Factory Sciences 1
1 through 30 of 933 similar documents, best matches first.   
Results by:Thunderstone Page: 1 2 3 4 5 6 7 8 9 10 next >>
1: Spacer Lithography Processes (Patent P1063) - SRC
Spacer Lithography Processes Application Type: Utility Patent Number: 8101481 Country: United States Status: Filed on 25-Feb-2008, Issued on 24-Jan-2012, Patent Abandoned ...
URL: https://www.src.org/library/patent/p1063/
Modified: 2012-01-24 - 20KB
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2: Step and Flash Imprint Lithography (Patent P0264) - SRC
Step and Flash Imprint Lithography Application Type: Utility Patent Number: 6719915 Country: United States Status: Filed on 19-Jul-2001, Issued on 13-Apr-2004 Organization: ...
URL: https://www.src.org/library/patent/p0264/
Modified: 2004-04-13 - 25KB
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3: Step and Flash Imprint Lithography (Patent P0238) - SRC
Step and Flash Imprint Lithography Application Type: Utility Patent Number: 6334960 Country: United States Status: Filed on 11-Mar-1999, Issued on 1-Jan-2002, Patent Expired ...
URL: https://www.src.org/library/patent/p0238/
Modified: 2002-01-01 - 25KB
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4: Single-Mask Double-Patterning Lithography (Patent P1185) - SRC
Single-Mask Double-Patterning Lithography Application Type: Utility Patent Number: 8415089 Country: United States Status: Filed on 15-Mar-2010, Issued on 9-Apr-2013, Patent ...
URL: https://www.src.org/library/patent/p1185/
Modified: 2013-04-09 - 22KB
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5: Elastomer Spatial Light Modulators for Extreme Ultraviolet Lithography...
Elastomer Spatial Light Modulators for Extreme Ultraviolet Lithography Application Type: Utility Patent Number: 7092138 Country: United States Status: Filed on 8-Oct-2004, Issued ...
URL: https://www.src.org/library/patent/p0491/
Modified: 2006-08-15 - 22KB
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6: Multiple-Thickness Gate Oxide Formed by Oxygen Implantation ...
Multiple-Thickness Gate Oxide Formed by Oxygen Implantation - device claims Application Type: Utility Patent Number: 6855994 Country: United States Status: Filed on 5-Sep-2001, ...
URL: https://www.src.org/library/patent/p0259/
Modified: 2005-02-15 - 26KB
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7: Multiple-Thickness Gate Oxide Formed by Oxygen Implantation ...
Multiple-Thickness Gate Oxide Formed by Oxygen Implantation - Method claims Application Type: Utility Patent Number: 6753229 Country: United States Status: Filed on 24-Nov-1999, ...
URL: https://www.src.org/library/patent/p0086/
Modified: 2004-06-22 - 26KB
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8: Optical Proximity Correction Using Regression (Patent P1118)...
Optical Proximity Correction Using Regression Application Type: Utility Patent Number: 8201110 Country: United States Status: Filed on 14-Apr-2009, Issued on 12-Jun-2012, Patent ...
URL: https://www.src.org/library/patent/p1118/
Modified: 2012-06-12 - 24KB
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9: Method of Forming Low-Resistivity RU ALD Through a BI-Layer Process...
Method of Forming Low-Resistivity RU ALD Through a BI-Layer Process and Related Structures Application Type: Utility Country: United States Status: Filed on 6-Dec-2022, Published ...
URL: https://www.src.org/library/patent/p2099/
Modified: 2022-12-06 - 23KB
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10: METHOD FOR CORRECTING A MASK DESIGN LAYOUT (Patent P1708) - SRC
METHOD FOR CORRECTING A MASK DESIGN LAYOUT Application Type: Utility Patent Number: 7149999 Country: United States Status: Filed on 25-Feb-2004, Issued on 12-Dec-2006, Patent ...
URL: https://www.src.org/library/patent/p1708/
Modified: 2006-12-12 - 23KB
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11: Capacitorless Dram Device on Silicon-On-Insulator Substrate ...
Capacitorless Dram Device on Silicon-On-Insulator Substrate Application Type: Utility Patent Number: 5448513 Country: United States Status: Filed on 2-Dec-1993, Issued on ...
URL: https://www.src.org/library/patent/p0032/
Modified: 1995-09-05 - 25KB
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12: Double Hidden Flexure Microactuator for Phase Mirror Array (Patent...
Double Hidden Flexure Microactuator for Phase Mirror Array Application Type: Utility Patent Number: 7075699 Country: United States Status: Filed on 28-Sep-2004, Issued on ...
URL: https://www.src.org/library/patent/p0508/
Modified: 2006-07-11 - 22KB
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13: Fabrication of Group III-Nitride Photocathode Having Cs Activation...
Fabrication of Group III-Nitride Photocathode Having Cs Activation Layer Application Type: Continuation (in part) Patent Number: 7455565 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p1082/
Modified: 2008-11-25 - 23KB
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14: Method for Correcting a Mask Design Layout (Patent P1016) - SRC
Method for Correcting a Mask Design Layout Application Type: Continuation Patent Number: 7614032 Country: United States Status: Filed on 11-Dec-2006, Issued on 3-Nov-2009, Patent ...
URL: https://www.src.org/library/patent/p1016/
Modified: 2009-11-03 - 23KB
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15: Method for Correcting a Mask Design Layout (Patent P0386) - SRC
Method for Correcting a Mask Design Layout Application Type: Utility Patent Number: 7149999 Country: United States Status: Filed on 25-Feb-2004, Issued on 12-Dec-2006, Patent ...
URL: https://www.src.org/library/patent/p0386/
Modified: 2006-12-12 - 23KB
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16: Density Multiplication and Improved Lithography by Directed Block...
Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly Application Type: Utility Patent Number: 9183870 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p1116/
Modified: 2015-11-10 - 26KB
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17: Method and System for Performing Optical Proximity Correction...
Method and System for Performing Optical Proximity Correction with Process Variations Considerations Application Type: Utility Patent Number: 7711504 Country: United States Status: ...
URL: https://www.src.org/library/patent/p1031/
Modified: 2010-05-04 - 23KB
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18: Fast Startup of Crystal and Other High-Q Oscillators (Patent...
Fast Startup of Crystal and Other High-Q Oscillators Application Type: Utility Country: United States Status: Filed on 25-Jan-2022, Published by Patent Office Organization: ...
URL: https://www.src.org/library/patent/p2014/
Modified: 2022-01-25 - 25KB
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19: Process for Optical Coherence Tomography and Apparatus for Optical...
Process for Optical Coherence Tomography and Apparatus for Optical Coherence Tomography Application Type: Utility Patent Number: 9197215 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p1460/
Modified: 2015-11-24 - 22KB
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20: Phase-Shifting Test Mask Patterns for Characterizing Illumination...
Phase-Shifting Test Mask Patterns for Characterizing Illumination and Mask Quality in Image Forming Optical Systems Application Type: Utility Patent Number: 7648802 Country: United ...
URL: https://www.src.org/library/patent/p0514/
Modified: 2010-01-19 - 23KB
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21: Bipolar Transistor Having Base Region With Coupled Delta Layers...
Bipolar Transistor Having Base Region With Coupled Delta Layers Application Type: Continuation (in part) Patent Number: 5965931 Country: United States Status: Filed on 15-Sep-1994, ...
URL: https://www.src.org/library/patent/p0003/
Modified: 1999-10-12 - 35KB
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22: CHARACTERIZING ABERRATIONS IN AN IMAGING LENS AND APPLICATIONS...
CHARACTERIZING ABERRATIONS IN AN IMAGING LENS AND APPLICATIONS TO VISUAL TESTING AND INTEGRATED CIRCUIT MASK ANALYSIS Application Type: Utility Patent Number: 7030997 Country: ...
URL: https://www.src.org/library/patent/p0302/
Modified: 2006-04-18 - 22KB
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23: Dual Work Function CMOS Gate Technology Based on Metal Interdiffusion...
Dual Work Function CMOS Gate Technology Based on Metal Interdiffusion Application Type: Divisional Patent Number: 7141858 Country: United States Status: Filed on 18-Jun-2004, ...
URL: https://www.src.org/library/patent/p0482/
Modified: 2006-11-28 - 22KB
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24: Dual Work Function CMOS Gate Technology Based on Metal Interdiffusion...
Dual Work Function CMOS Gate Technology Based on Metal Interdiffusion Application Type: Utility Patent Number: 6794234 Country: United States Status: Filed on 9-Dec-2002, Issued on ...
URL: https://www.src.org/library/patent/p0295/
Modified: 2004-09-21 - 22KB
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25: Method of Fabricating Quantum Bridges by Selective Etching of...
Method of Fabricating Quantum Bridges by Selective Etching of Superlattice Structures Application Type: Utility Patent Number: 5630905 Country: United States Status: Filed on ...
URL: https://www.src.org/library/patent/p0008/
Modified: 1997-05-20 - 35KB
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26: Methods for Decreasing Surface Roughness in Novolak-Based Resists...
Methods for Decreasing Surface Roughness in Novolak-Based Resists Application Type: Utility Patent Number: 6162592 Country: United States Status: Filed on 6-Oct-1998, Issued on ...
URL: https://www.src.org/library/patent/p0164/
Modified: 2000-12-19 - 22KB
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27: Method of Locating Areas in an Image Such as a Photo Mask Layout...
Method of Locating Areas in an Image Such as a Photo Mask Layout That Are Sensitive to Residual Processing Effects Application Type: Continuation (in part) Patent Number: 7155698 ...
URL: https://www.src.org/library/patent/p0409/
Modified: 2006-12-26 - 22KB
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28: Compounds Containing a Thiol Protected Group Bonded to a Protecting...
Compounds Containing a Thiol Protected Group Bonded to a Protecting Group Via a Polarized bond, and Structure Comprising the Compounds on its Surface. Application Type: Utility ...
URL: https://www.src.org/library/patent/p0613/
Modified: 2010-03-30 - 22KB
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29: Systems, Methods and Computer Program Products for Detecting...
Systems, Methods and Computer Program Products for Detecting the Position of a New Alignment Mark on a Substrate Based on Fitting to Sample Alignment Signals Application Type: ...
URL: https://www.src.org/library/patent/p0047/
Modified: 2000-05-16 - 22KB
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30: Step and Flash Imprint Lithography (Patent P0245) - SRC
Step and Flash Imprint Lithography Application Type: European Patent Office Patent Number: 1228401 Status: Filed on 3-Mar-2000, Issued on 10-Aug-2005 Organization: University of ...
URL: https://www.src.org/library/patent/p0245/
Modified: 2005-08-10 - 25KB
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1 through 30 of 933 similar documents, best matches first.   
Results by:Thunderstone Page: 1 2 3 4 5 6 7 8 9 10 next >>